Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors

In this paper, we present the progress in the growth of nanoscale semiconductors grown via atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD became a widespread tool to grow functional films and conformal ultra-thin coatings for various applications. Based on self...

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Bibliographic Details
Published inSemiconductor science and technology Vol. 32; no. 9; pp. 93002 - 93053
Main Authors Biyikli, Necmi, Haider, Ali
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.09.2017
Subjects
atomic layer deposition
III-nitride
metal-oxide
nanoscale
nanostructured
self-limiting
semiconductor
Online AccessGet full text
ISSN0268-1242
1361-6641
DOI10.1088/1361-6641/aa7ade

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