APA (7th ed.) Citation

Biyikli, N., & Haider, A. (2017). Atomic layer deposition: An enabling technology for the growth of functional nanoscale semiconductors. Semiconductor science and technology, 32(9), 93002-93053. https://doi.org/10.1088/1361-6641/aa7ade

Chicago Style (17th ed.) Citation

Biyikli, Necmi, and Ali Haider. "Atomic Layer Deposition: An Enabling Technology for the Growth of Functional Nanoscale Semiconductors." Semiconductor Science and Technology 32, no. 9 (2017): 93002-93053. https://doi.org/10.1088/1361-6641/aa7ade.

MLA (9th ed.) Citation

Biyikli, Necmi, and Ali Haider. "Atomic Layer Deposition: An Enabling Technology for the Growth of Functional Nanoscale Semiconductors." Semiconductor Science and Technology, vol. 32, no. 9, 2017, pp. 93002-93053, https://doi.org/10.1088/1361-6641/aa7ade.