High-Voltage (2.8 kV) Implantation-Free 4H-SiC BJTs With Long-Term Stability of the Current Gain
In this paper, implantation-free 4H-SiC bipolar junction transistors (BJTs) with a high breakdown voltage of 2800 V have been fabricated by utilizing a controlled two-step etched junction-termination extension in the epitaxial base layer. The small-area device shows a maximum direct-current (dc) gai...
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Published in | IEEE transactions on electron devices Vol. 58; no. 8; pp. 2665 - 2669 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
New York, NY
IEEE
01.08.2011
Institute of Electrical and Electronics Engineers The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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Summary: | In this paper, implantation-free 4H-SiC bipolar junction transistors (BJTs) with a high breakdown voltage of 2800 V have been fabricated by utilizing a controlled two-step etched junction-termination extension in the epitaxial base layer. The small-area device shows a maximum direct-current (dc) gain of 55 at J C = 0.33 A (J C = 825 A/cm 2 ) and V CESAT = 1.05 V at I c = 0.107 A that corresponds to a low specific ON-state resistance of 4 mΩ · cm 2 . The large-area device has a maximum dc gain of 52 at J C = 9.36 A (J C = 289 A/cm 2 ) and V CESAT = 1-14 V at I c = 5 A that corresponds to a specific ON-state resistance of 6.8 mΩ · cm 2 . In addition, these devices demonstrate a negative temperature coefficient of the current gain (β = 26 at 200 °C) and a positive temperature coefficient of the specific ON-state resistance (R ON = 10.2 mΩ · cm 2 at 200 °C). The small-area BJT shows no bipolar degradation and a low-current-gain degradation after a 150-h stress of the base-emitter diode with a current level of 0.2 A (J E = 500 A/cm 2 ). Furthermore, the large-area BJT shows a V CE fall time of 18 ns during turn-on and a V CE rise time of 10 ns during turn-off for 400-V switching characteristics. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2011.2154332 |