WO3 thin film prepared by pecvd technique and its gas sensing properties to NO2
Tungsten oxide films have been successfully fabricated from tungsten oxychloride (WOCl4) precursor by using plasma enhanced vapor deposition (PECVD) technique. The films were deposited onto silicon substrates and ceramic tubes maintained at 100°C under a constant operating pressure of He-O2 gas mixt...
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Published in | Journal of materials science Vol. 36; no. 10; pp. 2535 - 2538 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
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Heidelberg
Springer
01.01.2001
Springer Nature B.V |
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Abstract | Tungsten oxide films have been successfully fabricated from tungsten oxychloride (WOCl4) precursor by using plasma enhanced vapor deposition (PECVD) technique. The films were deposited onto silicon substrates and ceramic tubes maintained at 100°C under a constant operating pressure of He-O2 gas mixtures. The compositions and the structures of the thin films have been investigated by means of anaysis methods, such as XRD, XPS, UV and IR. The as-deposited WO3 thin films were amorphous state and became crystalline after annealing above 400°C. The surface analysis of the films indicates that stoichiometry O/W is 2.77 : 1. The gas sensing measurements of the WO3 thin film sensors indicate that these sensors have a high sensitivity, excellent selectivity and quick response behavior to NO2. |
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AbstractList | Tungsten oxide films have been successfully fabricated from tungsten oxychloride (WOCl4) precursor by using plasma enhanced vapor deposition (PECVD) technique. The films were deposited onto silicon substrates and ceramic tubes maintained at 100°C under a constant operating pressure of He-O2 gas mixtures. The compositions and the structures of the thin films have been investigated by means of anaysis methods, such as XRD, XPS, UV and IR. The as-deposited WO3 thin films were amorphous state and became crystalline after annealing above 400°C. The surface analysis of the films indicates that stoichiometry O/W is 2.77 : 1. The gas sensing measurements of the WO3 thin film sensors indicate that these sensors have a high sensitivity, excellent selectivity and quick response behavior to NO2. Tungsten oxide films have been successfully fabricated from tungsten oxychloride (WOCl4) precursor by using the plasma enhanced vapour deposition (PECVD) technique. The films were deposited onto silicon substrates and ceramic tubes maintained at 100 C under a constant operating pressure of He-O2 gas mixtures. The compositions and structures of the thin films were investigated by means of analysis methods, such as XRD, XPS, UV and IR. The as-deposited WO3 thin films were amorphous and became crystalline after annealing above 400 C. Surface analysis indicated that stoichiometry O/W is 2.77:1. Gas sensing measurements indicated that these sensors have a high sensitivity, excellent selectivity and quick response behaviour to NO2. 11 refs. |
Author | YUANDA WU GUORUI DAI MAOSONG TONG XIULI HE DINGSAN GAO |
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Keywords | Inorganic compounds Transition element compounds Crystallization Ultraviolet spectra Oxides Tungsten oxides XRD Amorphous state Infrared spectra Experimental study Fabrication property relation Photoelectron spectroscopy Characterization Thin films Growth from vapor X radiation PECVD Nitrogen dioxide Thermal annealing Gas sensors |
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Snippet | Tungsten oxide films have been successfully fabricated from tungsten oxychloride (WOCl4) precursor by using plasma enhanced vapor deposition (PECVD) technique.... Tungsten oxide films have been successfully fabricated from tungsten oxychloride (WOCl4) precursor by using the plasma enhanced vapour deposition (PECVD)... |
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SubjectTerms | Analytical chemistry Chemical analysis and related physical methods of analysis Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Chemistry Cross-disciplinary physics: materials science; rheology Exact sciences and technology Gas mixtures Gas sensors General equipment and techniques General, instrumentation Instruments, apparatus, components and techniques common to several branches of physics and astronomy Materials science Methods of deposition of films and coatings; film growth and epitaxy Nitrogen dioxide Oxide coatings Physics Selectivity Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing Silicon Silicon substrates Stoichiometry Surface analysis (chemical) Thin films Tubes Tungsten oxides Vapor deposition |
Title | WO3 thin film prepared by pecvd technique and its gas sensing properties to NO2 |
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