Fabrication of Gd2O3-doped CeO2 thin films through DC reactive sputtering and their application in solid oxide fuel cells

• Published in: International journal of minerals, metallurgy and materials Vol. 30; no. 6; pp. 1190 - 1197
• Main Authors: Liang, Fuyuan, Yang, Jiaran, Wang, Haiqing, Wu, Junwei
• Format: Journal Article
• Language: English
• Published: Beijing University of Science and Technology Beijing 01.06.2023; Springer Nature B.V; School of Materials Science and Engineering,Harbin Institute of Technology(Shenzhen),Shenzhen 518055,China
• Subjects: Buffer layers; Ceramics; Cerium oxides; Characterization and Evaluation of Materials; Chemistry and Materials Science; Composites; Corrosion and Coatings; Direct current; Electrochemical analysis; Electrochemistry; Fabrication; Flow rates; Fuel cells; Fuel technology; Gadolinium oxides; Glass; High temperature; Industrial applications; Materials Science; Metallic Materials; Natural Materials; Operating temperature; Oxidation rate; Physical vapor deposition; Solid oxide fuel cells; Sputtering; Surfaces and Interfaces; Thin Films; Tribology; Yttria-stabilized zirconia; Yttrium oxide; doped CeO; physical vapor deposition; solid oxide fuel cell; electrical conductivity; Gd; O; metallic interconnects; Gd2O3-doped CeO2

Physical vapor deposition (PVD) can be used to produce high-quality Gd 2 O 3 -doped CeO 2 (GDC) films. Among various PVD methods, reactive sputtering provides unique benefits, such as high deposition rates and easy upscaling for industrial applications. GDC thin films were successfully fabricated th...