3-D surface stereometry studies of sputtered TiN thin films obtained at different substrate temperatures

• Published in: Journal of materials science. Materials in electronics Vol. 28; no. 2; pp. 2113 - 2122
• Main Authors: Stach, Sebastian, Sapota, Wiktoria, Ţălu, Ştefan, Ahmadpourian, Azin, Luna, Carlos, Ghobadi, Nader, Arman, Ali, Ganji, Mohsen
• Format: Journal Article
• Language: English
• Published: New York Springer US 01.01.2017; Springer Nature B.V
• Subjects: Atomic force microscopy; Characterization and Evaluation of Materials; Chemistry and Materials Science; Curvature; Dependence; Electronics; Glass substrates; Image segmentation; Magnetron sputtering; Materials Science; Mathematical analysis; Morphology; Mountains; Optical and Electronic Materials; Substrates; Surface properties; Temperature; Thin films; Titanium nitride; Topography; Substrate Temperature; Titanium Nitride; Reactive Magnetron; Wear Resistant Coating; Motif Point

Nanostructured glass-supported thin films of titanium nitride (TiN) were prepared by reactive magnetron sputtering at different substrate temperatures (from 25 to 400 °C). The surface topography of such films was examined by atomic force microscopy (AFM). The obtained 3-D AFM images was divided into...