Work function alteration of the porous indium tin oxide nanorods film by electron beam irradiation technique

Material properties of transparent conductive oxide (TCO), such as crystallinity and work function, have been recognized as important factors affecting a performance of optoelectronic devices. In this work, a nuclear technique, electron beam irradiation, is proposed as a post deposition technique to...

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Published inRadiation physics and chemistry (Oxford, England : 1993) Vol. 188; p. 109664
Main Authors Chia, Jia Yi, Lertvanithphol, Tossaporn, Chaikeeree, Tanapoj, Seawsakul, Kittikhun, Thamrongsiripak, Nuatawan, Nakajima, Hideki, Songsiriritthigul, Prayoon, Horprathum, Mati, Nuntawong, Noppadon
Format Journal Article
LanguageEnglish
Published Oxford Elsevier Ltd 01.11.2021
Elsevier BV
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Abstract Material properties of transparent conductive oxide (TCO), such as crystallinity and work function, have been recognized as important factors affecting a performance of optoelectronic devices. In this work, a nuclear technique, electron beam irradiation, is proposed as a post deposition technique to alter the material characteristics of an indium tin oxide (ITO) nanorods film. The ITO film is fabricated by ion-assisted electron beam evaporation with glancing-angle deposition (GLAD) technique and subsequently irradiated by an electron beam with energy up to 20 MeV at the absorbed doses of 100 kGy and 300 kGy. The effect of irradiation, in terms of morphology and crystallinity, is studied by scanning electron microscopy (SEM), grazing incidence X-ray diffraction (GIXRD) and transmission electron microscopy (TEM). Whereas, the photoemission spectroscopy (PES) is carried out to study the surface composition and the work function of the ITO films. The SEM result indicates that the diameter of the ITO nanorods increases due to the electron beam irradiation. The electron beam induced crystallization of the ITO nanorod is observed and confirmed by both XRD and TEM measurements. Furthermore, the PES results reveal a change in the surface chemical composition and the work function of the ITO film after the electron beam irradiation. The results of this study implies that the electron beam irradiation serves as a promising post deposition treatment to improve the properties of ITO film, especially in terms of work function alteration. •Porous ITO nanorods films was fabricated by EB evaporation with GLAD technique.•EB irradiation was used as a post deposition treatment to improve film properties.•EB induces a change in morphology, crystallinity, composition and work function.•An alteration in work function could be achieved via varying irradiation doses.
AbstractList Material properties of transparent conductive oxide (TCO), such as crystallinity and work function, have been recognized as important factors affecting a performance of optoelectronic devices. In this work, a nuclear technique, electron beam irradiation, is proposed as a post deposition technique to alter the material characteristics of an indium tin oxide (ITO) nanorods film. The ITO film is fabricated by ion-assisted electron beam evaporation with glancing-angle deposition (GLAD) technique and subsequently irradiated by an electron beam with energy up to 20 MeV at the absorbed doses of 100 kGy and 300 kGy. The effect of irradiation, in terms of morphology and crystallinity, is studied by scanning electron microscopy (SEM), grazing incidence X-ray diffraction (GIXRD) and transmission electron microscopy (TEM). Whereas, the photoemission spectroscopy (PES) is carried out to study the surface composition and the work function of the ITO films. The SEM result indicates that the diameter of the ITO nanorods increases due to the electron beam irradiation. The electron beam induced crystallization of the ITO nanorod is observed and confirmed by both XRD and TEM measurements. Furthermore, the PES results reveal a change in the surface chemical composition and the work function of the ITO film after the electron beam irradiation. The results of this study implies that the electron beam irradiation serves as a promising post deposition treatment to improve the properties of ITO film, especially in terms of work function alteration.
Material properties of transparent conductive oxide (TCO), such as crystallinity and work function, have been recognized as important factors affecting a performance of optoelectronic devices. In this work, a nuclear technique, electron beam irradiation, is proposed as a post deposition technique to alter the material characteristics of an indium tin oxide (ITO) nanorods film. The ITO film is fabricated by ion-assisted electron beam evaporation with glancing-angle deposition (GLAD) technique and subsequently irradiated by an electron beam with energy up to 20 MeV at the absorbed doses of 100 kGy and 300 kGy. The effect of irradiation, in terms of morphology and crystallinity, is studied by scanning electron microscopy (SEM), grazing incidence X-ray diffraction (GIXRD) and transmission electron microscopy (TEM). Whereas, the photoemission spectroscopy (PES) is carried out to study the surface composition and the work function of the ITO films. The SEM result indicates that the diameter of the ITO nanorods increases due to the electron beam irradiation. The electron beam induced crystallization of the ITO nanorod is observed and confirmed by both XRD and TEM measurements. Furthermore, the PES results reveal a change in the surface chemical composition and the work function of the ITO film after the electron beam irradiation. The results of this study implies that the electron beam irradiation serves as a promising post deposition treatment to improve the properties of ITO film, especially in terms of work function alteration. •Porous ITO nanorods films was fabricated by EB evaporation with GLAD technique.•EB irradiation was used as a post deposition treatment to improve film properties.•EB induces a change in morphology, crystallinity, composition and work function.•An alteration in work function could be achieved via varying irradiation doses.
ArticleNumber 109664
Author Thamrongsiripak, Nuatawan
Lertvanithphol, Tossaporn
Seawsakul, Kittikhun
Chia, Jia Yi
Horprathum, Mati
Nuntawong, Noppadon
Chaikeeree, Tanapoj
Nakajima, Hideki
Songsiriritthigul, Prayoon
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Snippet Material properties of transparent conductive oxide (TCO), such as crystallinity and work function, have been recognized as important factors affecting a...
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elsevier
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StartPage 109664
SubjectTerms Chemical composition
Crystal structure
Crystallinity
Crystallization
Deposition
Diameters
Electron beam irradiation
Electron beams
Electron irradiation
GLAD
Indium tin oxides
ITO
Material properties
Morphology
Nanorods
Optoelectronic devices
Photoelectric emission
Scanning electron microscopy
Transmission electron microscopy
Work function
Work functions
Title Work function alteration of the porous indium tin oxide nanorods film by electron beam irradiation technique
URI https://dx.doi.org/10.1016/j.radphyschem.2021.109664
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