Control of ion charge states in vacuum arc ion source by imposition of a non-uniform magnetic field

• Published in: Surface & coatings technology Vol. 201; no. 19; pp. 8615 - 8619
• Main Authors: Krinberg, I.A., Matafonov, G.K.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 05.08.2007
• Subjects: Ion beam; Ion charge state; Magnetic field; Vacuum arc; Ion beam; Ion charge state; Vacuum arc; Magnetic field

The influence of the magnetic field geometry configuration on electron temperature and ion charge state in the vacuum arc ion source has been studied theoretically. It is found that a high value of electron temperature and ionization rate is retained at the exit from the annular anode (where cathodi...