Kinematic analysis of in situ measurement during chemical mechanical planarization process - Li, Hongkai; Wang, Tongqing; Zhao, Qian; Meng, Yonggang; Lu, Xinchun (Review of scientific instruments, 2015)
Keywords: Chemical-mechanical polishing; CONTROL SYSTEMS; In situ measurement; INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; Kinematics; MANUFACTURING; Mathematical models; Organic chemistry; PROBES; PRODUCTIVITY; Scientific apparatus & instruments; SEMICONDUCTOR MATERIALS; SURFACES; TRAJECTORIES; Trajectory measurement; VELOCITY