Microstructure and properties of Ti2AlN thin film synthesized by vacuum annealing of high power pulsed magnetron sputtering deposited Ti/AlN multilayers

• Published in: Surface & coatings technology Vol. 425; p. 127749
• Main Authors: Ma, D.L., Deng, Q.Y., Liu, H.Y., Li, Y.T., Leng, Y.X.
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 15.11.2021; Elsevier BV
• Subjects: Adhesion; Aluminum nitride; Coefficient of friction; Crystallization; Hardness; High power pulsed magnetron sputtering; Magnetron sputtering; Microstructure; Modulation; Multilayers; Photovoltaic cells; Smoothness; Substrates; Thin films; Ti2AlN; Vacuum annealing; Wear resistance; Ti2AlN; High power pulsed magnetron sputtering; Wear resistance; Microstructure; Hardness; Adhesion

The (002) texture, compactness, and smoothness Ti2AlN thin films render them promising for many potential applications, especially in the surface modification of wear-resistant components. In this study, Ti2AlN thin films were fabricated by the vacuum annealing of Ti/AlN multilayers deposited by hig...