Microstructure and properties of Ti2AlN thin film synthesized by vacuum annealing of high power pulsed magnetron sputtering deposited Ti/AlN multilayers

The (002) texture, compactness, and smoothness Ti2AlN thin films render them promising for many potential applications, especially in the surface modification of wear-resistant components. In this study, Ti2AlN thin films were fabricated by the vacuum annealing of Ti/AlN multilayers deposited by hig...

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Published inSurface & coatings technology Vol. 425; p. 127749
Main Authors Ma, D.L., Deng, Q.Y., Liu, H.Y., Li, Y.T., Leng, Y.X.
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier B.V 15.11.2021
Elsevier BV
Subjects
Adhesion
Aluminum nitride
Coefficient of friction
Crystallization
Hardness
High power pulsed magnetron sputtering
Magnetron sputtering
Microstructure
Modulation
Multilayers
Photovoltaic cells
Smoothness
Substrates
Thin films
Ti2AlN
Vacuum annealing
Wear resistance
Ti2AlN
High power pulsed magnetron sputtering
Wear resistance
Microstructure
Hardness
Adhesion
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Abstract The (002) texture, compactness, and smoothness Ti2AlN thin films render them promising for many potential applications, especially in the surface modification of wear-resistant components. In this study, Ti2AlN thin films were fabricated by the vacuum annealing of Ti/AlN multilayers deposited by high power pulsed magnetron sputtering (HPPMS). The influence of the multilayer modulation ratio and modulation period of Ti/AlN on the microstructure and properties of the Ti2AlN thin film were explored. The results indicate that a Ti/AlN modulation ratio close to 6:4 and period less than 30 nm are appropriate for yielding high-quality crystallized Ti2AlN thin films. The microstructure of the Ti2AlN thin film is (002) textured, nanocrystalline, smooth, and compact, which benefits from the HPPMS technique. The Ti2AlN thin film adheres well to the substrate and has a hardness of 32.5 ± 2.1 GPa and has a friction coefficient of 0.15 while tested with a Si3N4 friction pair. •The modulation ratio and period are critical for Ti2AlN thin film synthesis.•HPPMS improves the (002) texture and compactness of the Ti2AlN thin film.•HPPMS enhances the adhesion, hardness and wear resistance of the Ti2AlN thin film.
AbstractList The (002) texture, compactness, and smoothness Ti2AlN thin films render them promising for many potential applications, especially in the surface modification of wear-resistant components. In this study, Ti2AlN thin films were fabricated by the vacuum annealing of Ti/AlN multilayers deposited by high power pulsed magnetron sputtering (HPPMS). The influence of the multilayer modulation ratio and modulation period of Ti/AlN on the microstructure and properties of the Ti2AlN thin film were explored. The results indicate that a Ti/AlN modulation ratio close to 6:4 and period less than 30 nm are appropriate for yielding high-quality crystallized Ti2AlN thin films. The microstructure of the Ti2AlN thin film is (002) textured, nanocrystalline, smooth, and compact, which benefits from the HPPMS technique. The Ti2AlN thin film adheres well to the substrate and has a hardness of 32.5 ± 2.1 GPa and has a friction coefficient of 0.15 while tested with a Si3N4 friction pair. •The modulation ratio and period are critical for Ti2AlN thin film synthesis.•HPPMS improves the (002) texture and compactness of the Ti2AlN thin film.•HPPMS enhances the adhesion, hardness and wear resistance of the Ti2AlN thin film.
The (002) texture, compactness, and smoothness Ti2AlN thin films render them promising for many potential applications, especially in the surface modification of wear-resistant components. In this study, Ti2AlN thin films were fabricated by the vacuum annealing of Ti/AlN multilayers deposited by high power pulsed magnetron sputtering (HPPMS). The influence of the multilayer modulation ratio and modulation period of Ti/AlN on the microstructure and properties of the Ti2AlN thin film were explored. The results indicate that a Ti/AlN modulation ratio close to 6:4 and period less than 30 nm are appropriate for yielding high-quality crystallized Ti2AlN thin films. The microstructure of the Ti2AlN thin film is (002) textured, nanocrystalline, smooth, and compact, which benefits from the HPPMS technique. The Ti2AlN thin film adheres well to the substrate and has a hardness of 32.5 ± 2.1 GPa and has a friction coefficient of 0.15 while tested with a Si3N4 friction pair.
ArticleNumber 127749
Author Leng, Y.X.
Liu, H.Y.
Li, Y.T.
Deng, Q.Y.
Ma, D.L.
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  email: yxleng@263.net
  organization: Key Laboratory of Advanced Technologies of Materials, Ministry of Education, School of Materials Science and Engineering, Southwest Jiaotong University, Chengdu 610031, China
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CitedBy_id crossref_primary_10_3390_ma16237294
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Keywords Ti2AlN
High power pulsed magnetron sputtering
Wear resistance
Microstructure
Hardness
Adhesion
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– volume: 38
  start-page: 205
  year: 2020
  ident: 10.1016/j.surfcoat.2021.127749_bb0150
  article-title: Structural defects in MAX phases and their derivative MXenes: a look forward
  publication-title: J. Mater. Sci. Technol.
  doi: 10.1016/j.jmst.2019.03.049
  contributor:
    fullname: Zhang
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Snippet The (002) texture, compactness, and smoothness Ti2AlN thin films render them promising for many potential applications, especially in the surface modification...
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StartPage 127749
SubjectTerms Adhesion
Aluminum nitride
Coefficient of friction
Crystallization
Hardness
High power pulsed magnetron sputtering
Magnetron sputtering
Microstructure
Modulation
Multilayers
Photovoltaic cells
Smoothness
Substrates
Thin films
Ti2AlN
Vacuum annealing
Wear resistance
Title Microstructure and properties of Ti2AlN thin film synthesized by vacuum annealing of high power pulsed magnetron sputtering deposited Ti/AlN multilayers
URI https://dx.doi.org/10.1016/j.surfcoat.2021.127749
https://www.proquest.com/docview/2606930102
Volume 425
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