A study on formation of Al and Al2O3 on the porous paper by DC magnetron sputtering

• Published in: Surface & coatings technology Vol. 171; no. 1-3; pp. 65 - 70
• Main Authors: Chung, Yun M., Jung, Min J., Nam, Kyung H., Han, Jeon G., Baeg, Seung H., Yang, Se H.
• Format: Journal Article
• Language: English
• Published: Lausanne Elsevier B.V 01.07.2003; Elsevier
• Subjects: Aluminum; Cross-disciplinary physics: materials science; rheology; Deposition by sputtering; Exact sciences and technology; Magnetron sputtering; Materials science; Metallized paper; Methods of deposition of films and coatings; film growth and epitaxy; Physics; Water vapor permeability; Magnetron sputtering; Aluminum; Metallized paper; Water vapor permeability; Magnetrons; Scanning electron microscopy; Gas permeability; Steam; Physical vapor deposition; Aluminium; XRD; Experimental study; Alumina; Sputtering
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/S0257-8972(03)00237-8

Understanding the mode of transport of water vapor through the film is important for improving the moisture barrier properties of metallized porous papers. For the synthesis of Al metallized porous papers, it was carried out by DC planar magnetron sputtering with various target power densities and film thickness. To correlate film characteristics with moisture barrier properties, film properties were determined by X-ray diffraction, scanning electron microscopy, Auger electron spectroscopy and evaluations of water vapor permeability (WVP). It changed preferred orientations from Al(111) to α-Al2O3(110) reacted with thermal activated oxygen from the paper as film thickness increase and the minimum WVP mean is 2.16×10−7 gmm/m2hkPa at 6.3 W/cm2, 2 μm and the maximum is 2.00×10−8 gmm/m2hkPa at 1.2 W/cm2, 0.2 μm.