Suppressive effect of novel aromatic diamine compound on nuclear factor-κB-dependent expression of inducible nitric oxide synthase in macrophages

N 1-Benzyl-4-methylbenzene-1,2-diamine (BMD) is a novel synthetic compound. In the present study, BMD compound was discovered to inhibit nitric oxide (NO) production in macrophages RAW 264.7. BMD compound attenuated lipopolysaccharide (LPS)-induced synthesis of both mRNA and protein of inducible nit...

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Published inEuropean journal of pharmacology Vol. 521; no. 1; pp. 1 - 8
Main Authors Shin, Hyun-Mo, Byung Hak Kim, Eun Yong Chung, Jung, Sang-Hun, Yeong Shik Kim, Kyung Rak Min, Kim, Youngsoo
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 03.10.2005
Elsevier
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Summary:N 1-Benzyl-4-methylbenzene-1,2-diamine (BMD) is a novel synthetic compound. In the present study, BMD compound was discovered to inhibit nitric oxide (NO) production in macrophages RAW 264.7. BMD compound attenuated lipopolysaccharide (LPS)-induced synthesis of both mRNA and protein of inducible nitric oxide synthase (iNOS), and inhibited LPS-induced iNOS promoter activity, indicating that the aromatic diamine compound could down-regulate iNOS expression at the transcription level. As a mechanism of the anti-inflammatory action, suppression of BMD compound on nuclear factor (NF)-κB activation has been documented. BMD compound exhibited dose-dependent inhibitory effect on LPS-mediated NF-κB transcriptional activity in the macrophages. Further, the compound inhibited LPS-mediated nuclear translocation of NF-κB p65 and DNA binding activity of NF-κB complex, in parallel, but did not affect LPS-mediated degradation of inhibitory κBα protein (IκBα). These results indicate that BMD compound could inhibit nuclear localization step of NF-κB p65 without affecting IκBα degradation. Finally, BMD compound could provide an invaluable tool to investigate NF-κB-dependent iNOS expression, in addition to its therapeutic potential in NO-associated inflammatory diseases.
ISSN:0014-2999
1879-0712
DOI:10.1016/j.ejphar.2005.07.013