Preparation of amino group functionalized diamond using photocatalyst and thermal conductivity of diamond/copper composite by electroplating

We focused on a micro diamond (MD) particle with the highest thermal conductivity among existing materials and aimed to make a MD/copper composite material by electroplating. However, copper is naturally non-wetting with MD due to its chemical incompatibility, leading to weak interfacial bonding and...

Full description

Saved in:
Bibliographic Details
Published inDiamond and related materials Vol. 118; p. 108509
Main Authors Ishida, Naoya, Kato, Kazuki, Suzuki, Norihiro, Fujimoto, Kenjiro, Hagio, Takeshi, Ichino, Ryoichi, Kondo, Takeshi, Yuasa, Makoto, Uetsuka, Hiroshi, Fujishima, Akira, Terashima, Chiaki
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 01.10.2021
Elsevier BV
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:We focused on a micro diamond (MD) particle with the highest thermal conductivity among existing materials and aimed to make a MD/copper composite material by electroplating. However, copper is naturally non-wetting with MD due to its chemical incompatibility, leading to weak interfacial bonding and high thermal resistance. We improved the wettability between MD and copper functionalized by the amino group on the MD using a photocatalytic reaction. The functionalization of the diamond surface by amino groups was achieved by treating the MDs in a 3-aminopropyltrimethoxysilane-containing solution. The amino group functionalized MD was dispersed in the electroplating bath, where copper was deposited on the MD. As a result, the composite material of amino group functionalized MD assisted by photocatalyst and copper improved their interfacial affinity and exhibited the high thermal conductivity of 595 W/m K. [Display omitted] •The amino group is successfully functionalized into diamond by photocatalytic assist.•The amino group on diamond improves wettability for Cu surface.•Diamond/Cu composite exhibits 595 W/m K with 20 vol% diamond.
ISSN:0925-9635
1879-0062
DOI:10.1016/j.diamond.2021.108509