The measurement and impact of negative oxygen ions during reactive sputter deposition

• Published in: Critical reviews in solid state and materials sciences Vol. 49; no. 4; pp. 718 - 753
• Main Author: Depla, D.
• Format: Journal Article
• Language: English
• Published: Boca Raton Taylor & Francis 03.07.2024; Taylor & Francis Ltd
• Subjects: Cathode sputtering; Deposition; Discharge; Electric fields; Electron bombardment; Energy; ion assisted deposition; Ion bombardment; Ions; Magnetic properties; Magnetron sputtering; Negative ion yield; Negative ions; Oxygen; Oxygen ions; Substrates; Thin films; Trajectory measurement

Many thin film applications are based on oxides. The optimization of the oxide properties is an on-going process and requires a deep understanding of the deposition process. A typical feature of reactive (magnetron) sputter deposition is the presence of negative oxygen ions. Two groups of ions can b...