Surface roughening of undoped and in situ B-doped SiGe epitaxial layers deposited by using reduced pressure chemical vapor deposition - Kim, Youngmo; Park, Jiwoo; Sohn, Hyunchul (Journal of the Korean Physical Society, 2018)
Keywords: Boron; Chemical vapor deposition; Epitaxial growth; Epitaxial layers; Flow velocity; Mathematical and Computational Physics; Particle and Nuclear Physics; Physics; Physics and Astronomy; Roughening; Silicon germanides; Surface roughness; Theoretical; 물리학; Residual strain; Surface roughness; Surface roughening; Boron doping; Silicon-germanium (SiGe)