Fabrication of high density CdTe/GaAs nanodot arrays using nanoporous alumina masks

Long-range ordered semiconductor CdTe nanodot arrays of the uniform size were formed by molecular-beam epitaxy on the GaAs substrate as a replica of the nanoporous alumina mask in spite of the large lattice mismatch between GaAs and CdTe. The number per unit area and the size of nanodots of the hete...

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Published inCurrent applied physics Vol. 6; pp. e187 - e191
Main Authors Jung, Mi, Lee, Hong Seok, Park, Hong Lee, Mho, Sun-il
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.08.2006
한국물리학회
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ISSN1567-1739
1878-1675
DOI10.1016/j.cap.2006.01.036

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Abstract Long-range ordered semiconductor CdTe nanodot arrays of the uniform size were formed by molecular-beam epitaxy on the GaAs substrate as a replica of the nanoporous alumina mask in spite of the large lattice mismatch between GaAs and CdTe. The number per unit area and the size of nanodots of the heterostructure semiconductor CdTe/GaAs were controlled by those of pores in the mask. Using a very thin nanoporous alumina mask (<200nm thick) prepared at the anodization voltage of 30V in oxalic acid, fabricated were the arrays of CdTe nanodots (55nm diameter) with the large number per unit area of 1.3×1010cm−2.
AbstractList Long-range ordered semiconductor CdTe nanodot arrays of the uniform size were formed by molecular-beam epitaxy on the GaAssubstrate as a replica of the nanoporous alumina mask in spite of the large lattice mismatch between GaAs and CdTe. The number perunit area and the size of nanodots of the heterostructure semiconductor CdTe/GaAs were controlled by those of pores in the mask. Usingarrays of CdTe nanodots (55 nm diameter) with the large number per unit area of 1.3 x 1010 cm. -2. KCI Citation Count: 4
Long-range ordered semiconductor CdTe nanodot arrays of the uniform size were formed by molecular-beam epitaxy on the GaAs substrate as a replica of the nanoporous alumina mask in spite of the large lattice mismatch between GaAs and CdTe. The number per unit area and the size of nanodots of the heterostructure semiconductor CdTe/GaAs were controlled by those of pores in the mask. Using a very thin nanoporous alumina mask (<200nm thick) prepared at the anodization voltage of 30V in oxalic acid, fabricated were the arrays of CdTe nanodots (55nm diameter) with the large number per unit area of 1.3×1010cm−2.
Author Mho, Sun-il
Jung, Mi
Park, Hong Lee
Lee, Hong Seok
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  email: mho@ajou.ac.kr
  organization: Department of Molecular Science and Technology, Ajou University, Suwon 443-749, Republic of Korea
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Keywords Molecular beam epitaxy
CdTe nanodot arrays
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Nanoporous alumina mask
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Snippet Long-range ordered semiconductor CdTe nanodot arrays of the uniform size were formed by molecular-beam epitaxy on the GaAs substrate as a replica of the...
Long-range ordered semiconductor CdTe nanodot arrays of the uniform size were formed by molecular-beam epitaxy on the GaAssubstrate as a replica of the...
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SubjectTerms CdTe nanodot arrays
Molecular beam epitaxy
Nanoporous alumina mask
물리학
Title Fabrication of high density CdTe/GaAs nanodot arrays using nanoporous alumina masks
URI https://dx.doi.org/10.1016/j.cap.2006.01.036
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