Process optimization for inkjet printing of triisopropylsilylethynyl pentacene with single-solvent solutions
Inkjet printing of 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS-PEN), a small molecule organic semiconductor, is performed on two types of substrates. Hydrophilic SiO2 substrates prepared by a combination of surface treatments lead to either a smaller size or a coffee-ring profile of the singl...
Saved in:
Published in | Thin solid films Vol. 578; pp. 11 - 19 |
---|---|
Main Authors | , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
02.03.2015
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Inkjet printing of 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS-PEN), a small molecule organic semiconductor, is performed on two types of substrates. Hydrophilic SiO2 substrates prepared by a combination of surface treatments lead to either a smaller size or a coffee-ring profile of the single-drop film. A hydrophobic surface with dominant dispersive component of surface energy such as that of a spin-coated poly(4-vinylphenol) film favors profile formation with uniform thickness of the printed semiconductor owing to the strong dispersion force between the semiconductor molecules and the hydrophobic surface of the substrate. With a hydrophobic dielectric as the substrate and via a properly selected solvent, high quality TIPS-PEN films were printed at a very low substrate temperature of 35°C. Saturated field-effect mobility measured with top-contact thin-film transistor structure shows a narrow distribution and a maximum of 0.78cm2V−1s−1, which confirmed the film growth on the hydrophobic substrate with increased crystal coverage and continuity under the optimized process condition.
•Hydrophobic substrates were employed to inhibit the coffee-ring effect.•Contact-line pinning is primarily controlled by the dispersion force.•Solvent selection is critical to crystal coverage of the printed film.•High performance and uniformity are achieved by process optimization. |
---|---|
Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2015.02.004 |