Novel Technique for Phase-Shifting-Mask Repair Using Focused-Ion-Beam Etch-Back Process

• Published in: Japanese Journal of Applied Physics Vol. 31; no. 12S; p. 4468
• Main Authors: Hosono, Kunihiro, Nagamura, Yoshikazu, Kusunose, Haruhiko, Yoshioka, Nobuyuki, Yaichiro Watakabe, Yaichiro Watakabe, Yoichi Akasaka, Yoichi Akasaka
• Format: Journal Article
• Language: English
• Published: 01.12.1992

For the repair of phase-shifter (PS) defects with good topology and without optical deterioration, a new repair technique has been developed by using focused-ion-beam (FIB) etch-back and laser-explosion processes. This technique mainly consists of three steps: (1) leveling of defects by FIB-assisted...