Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy

• Published in: Angewandte Chemie International Edition Vol. 64; no. 2; pp. e202414360 - n/a
• Main Authors: Chen, Weizhou, Wang, Liming, Wang, Zi‐Rui, Zhu, Tao, Ye, Yuting, Li, Qiao‐Hong, Yi, Xiaofeng, Zhang, Jian
• Format: Journal Article
• Language: English
• Published: Germany Wiley Subscription Services, Inc 10.01.2025
• Edition: International ed. in English
• Subjects: Atomic force microscopy; atomically precise structures; Clusters; Coordination; Dopants; Electron beam lithography; film-forming ability; Free radicals; heterometal strategy; Homogeneity; Infrared spectroscopy; Iron; Lithography; Nanoclusters; Nanolithography; nanolithography materials; Reflectance; Solubility; Structural design; Structural engineering; Tin; tin-oxo-clusters; film-forming ability; heterometal strategy; nanolithography materials; tin-oxo-clusters; atomically precise structures

Tin‐oxo clusters are increasingly recognized as promising materials for nanolithography technology due to their unique properties, yet their structural impacts on lithography performance remain underexplored. This work explores the structural impacts of heterometal strategies on the performance of t...