Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy - Chen, Weizhou; Wang, Liming; Wang, Zi‐Rui; Zhu, Tao; Ye, Yuting; Li, Qiao‐Hong; Yi, Xiaofeng; Zhang, Jian (Angewandte Chemie International Edition, 2025)
Keywords: Atomic force microscopy; atomically precise structures; Clusters; Coordination; Dopants; Electron beam lithography; film-forming ability; Free radicals; heterometal strategy; Homogeneity; Infrared spectroscopy; Iron; Lithography; Nanoclusters; Nanolithography; nanolithography materials; Reflectance; Solubility; Structural design; Structural engineering; Tin; tin-oxo-clusters; film-forming ability; heterometal strategy; nanolithography materials; tin-oxo-clusters; atomically precise structures