APA (7th ed.) Citation

Chen, W., Wang, L., Wang, Z., Zhu, T., Ye, Y., Li, Q., . . . Zhang, J. (2025). Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy Angewandte Chemie International Edition, 64(2), e202414360-n/a. https://doi.org/10.1002/anie.202414360

Chicago Style (17th ed.) Citation

Chen, Weizhou, Liming Wang, Zi‐Rui Wang, Tao Zhu, Yuting Ye, Qiao‐Hong Li, Xiaofeng Yi, and Jian Zhang. "Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy." Angewandte Chemie International Edition 64, no. 2 (2025): e202414360-n/a. https://doi.org/10.1002/anie.202414360.

MLA (9th ed.) Citation

Chen, Weizhou, et al. "Improving the Lithography Sensitivity of Atomically Precise Tin‐Oxo Nanoclusters via Heterometal Strategy." Angewandte Chemie International Edition, vol. 64, no. 2, 2025, pp. e202414360-n/a, https://doi.org/10.1002/anie.202414360.