Photolithographic fabrication of graphene-based all-solid-state planar on-chip microsupercapacitors with ultrahigh power characteristics

• Published in: Journal of applied physics Vol. 126; no. 16
• Main Authors: Zhang, Ludi, Liu, Linjing, Liu, Chunfeng, Li, Xiang, Liu, Fangshuo, Zhao, Wenqiang, Wang, Shu, Wu, Fengmin, Zhang, Guangyu
• Format: Journal Article
• Language: English
• Published: Melville American Institute of Physics 28.10.2019
• Subjects: Applied physics; Electrodes; Graphene; Oxide coatings; Photolithography; Solid state; Spin coating; Thickness; Time constant

The fabrication of all-solid-state planar on-chip microsupercapacitors with ultrahigh power characteristics was demonstrated by reduced graphene oxide and photolithography technology. In this paper, an ultrathin reduced graphene oxide film with a thickness of 8 nm was prepared by a modified spin coa...