Photolithographic fabrication of graphene-based all-solid-state planar on-chip microsupercapacitors with ultrahigh power characteristics

The fabrication of all-solid-state planar on-chip microsupercapacitors with ultrahigh power characteristics was demonstrated by reduced graphene oxide and photolithography technology. In this paper, an ultrathin reduced graphene oxide film with a thickness of 8 nm was prepared by a modified spin coa...

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Published inJournal of applied physics Vol. 126; no. 16
Main Authors Zhang, Ludi, Liu, Linjing, Liu, Chunfeng, Li, Xiang, Liu, Fangshuo, Zhao, Wenqiang, Wang, Shu, Wu, Fengmin, Zhang, Guangyu
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 28.10.2019
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Abstract The fabrication of all-solid-state planar on-chip microsupercapacitors with ultrahigh power characteristics was demonstrated by reduced graphene oxide and photolithography technology. In this paper, an ultrathin reduced graphene oxide film with a thickness of 8 nm was prepared by a modified spin coating method that makes the microsupercapacitors have higher power characteristics which appear in high conductivity and fast charge and discharge rates. The electrodes, with a width of 150 μm, are narrower than existing electrodes in the field and fabricated by photolithography. In terms of performance, these microsupercapacitors have an extremely short time constant which is 0.03 ms, a high power density which is 17.94 W cm−3, and an excellent cycle stability with a capacitance retention of 94.6% after 10 000 cycles.
AbstractList The fabrication of all-solid-state planar on-chip microsupercapacitors with ultrahigh power characteristics was demonstrated by reduced graphene oxide and photolithography technology. In this paper, an ultrathin reduced graphene oxide film with a thickness of 8 nm was prepared by a modified spin coating method that makes the microsupercapacitors have higher power characteristics which appear in high conductivity and fast charge and discharge rates. The electrodes, with a width of 150 μm, are narrower than existing electrodes in the field and fabricated by photolithography. In terms of performance, these microsupercapacitors have an extremely short time constant which is 0.03 ms, a high power density which is 17.94 W cm−3, and an excellent cycle stability with a capacitance retention of 94.6% after 10 000 cycles.
Author Zhang, Guangyu
Liu, Chunfeng
Zhang, Ludi
Liu, Fangshuo
Zhao, Wenqiang
Wu, Fengmin
Liu, Linjing
Wang, Shu
Li, Xiang
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Snippet The fabrication of all-solid-state planar on-chip microsupercapacitors with ultrahigh power characteristics was demonstrated by reduced graphene oxide and...
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SubjectTerms Applied physics
Electrodes
Graphene
Oxide coatings
Photolithography
Solid state
Spin coating
Thickness
Time constant
Title Photolithographic fabrication of graphene-based all-solid-state planar on-chip microsupercapacitors with ultrahigh power characteristics
URI http://dx.doi.org/10.1063/1.5109691
https://www.proquest.com/docview/2310779325
Volume 126
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