Moiré engineering in 2D heterostructures with process-induced strain

We report deterministic control over a moiré superlattice interference pattern in twisted bilayer graphene by implementing designable device-level heterostrain with process-induced strain engineering, a widely used technique in industrial silicon nanofabrication processes. By depositing stressed thi...

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Bibliographic Details
Published inApplied physics letters Vol. 122; no. 14
Main Authors Peña, Tara, Dey, Aditya, Chowdhury, Shoieb A., Azizimanesh, Ahmad, Hou, Wenhui, Sewaket, Arfan, Watson, Carla, Askari, Hesam, Wu, Stephen M.
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 03.04.2023
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