Ion beam irradiation of nanostructures: sputtering, dopant incorporation, and dynamic annealing
Nanostructured materials are today subject to intense research, as their mesoscopic properties will enable a variety of new applications in the future. They can be grown with specific properties under equilibrium conditions by a variety of different top-down and bottom-up synthesis techniques. Subse...
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| Published in | Semiconductor science and technology Vol. 30; no. 3; pp. 33001 - 33013 |
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| Main Authors | , , |
| Format | Journal Article |
| Language | English |
| Published |
IOP Publishing
01.03.2015
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| Subjects | |
| Online Access | Get full text |
| ISSN | 0268-1242 1361-6641 |
| DOI | 10.1088/0268-1242/30/3/033001 |
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| Abstract | Nanostructured materials are today subject to intense research, as their mesoscopic properties will enable a variety of new applications in the future. They can be grown with specific properties under equilibrium conditions by a variety of different top-down and bottom-up synthesis techniques. Subsequent modification, including doping or alloying using the highly non-equilibrium process of ion irradiation, significantly expands the potpourri of functionality of what is today an important material class. Important and newly discovered effects must be considered compared to ion irradiation of bulk or thin film counterparts, as the ion range becomes comparable to the size of the nanotructure. Here, we will review recent high fluence irradiation studies reporting on non-linear incorporation of implanted species, enhanced sputtering yields, morphological changes induced by the high thermal impact, as well as strongly enhanced dynamic annealing for such confined nanostructures. Our review will also include the concurrent and recent progress in developing new simulation tools in order to describe and quantify those newly observed effects. |
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| AbstractList | Nanostructured materials are today subject to intense research, as their mesoscopic properties will enable a variety of new applications in the future. They can be grown with specific properties under equilibrium conditions by a variety of different top-down and bottom-up synthesis techniques. Subsequent modification, including doping or alloying using the highly non-equilibrium process of ion irradiation, significantly expands the potpourri of functionality of what is today an important material class. Important and newly discovered effects must be considered compared to ion irradiation of bulk or thin film counterparts, as the ion range becomes comparable to the size of the nanotructure. Here, we will review recent high fluence irradiation studies reporting on non-linear incorporation of implanted species, enhanced sputtering yields, morphological changes induced by the high thermal impact, as well as strongly enhanced dynamic annealing for such confined nanostructures. Our review will also include the concurrent and recent progress in developing new simulation tools in order to describe and quantify those newly observed effects. |
| Author | Johannes, Andreas Ronning, Carsten Holland-Moritz, Henry |
| Author_xml | – sequence: 1 givenname: Andreas surname: Johannes fullname: Johannes, Andreas organization: Friedrich Schiller University Jena Institute for Solid State Physics, Max-Wien-Platz 1, D-07743 Jena, Germany – sequence: 2 givenname: Henry surname: Holland-Moritz fullname: Holland-Moritz, Henry organization: Friedrich Schiller University Jena Institute for Solid State Physics, Max-Wien-Platz 1, D-07743 Jena, Germany – sequence: 3 givenname: Carsten surname: Ronning fullname: Ronning, Carsten email: carsten.ronning@uni-jena.de organization: Friedrich Schiller University Jena Institute for Solid State Physics, Max-Wien-Platz 1, D-07743 Jena, Germany |
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| SubjectTerms | dynamic annealing ion implantation ion irradiation nanomaterials nanostructures nanowires sputtering |
| Title | Ion beam irradiation of nanostructures: sputtering, dopant incorporation, and dynamic annealing |
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