Piezoresistive pressure sensor using nanocrystalline silicon thin film on flexible substrate
[Display omitted] •Pressure sensor using nc-Si by Aluminum Induced Crystallization on polyimide.•Novel recipe for device-fabrication bypassing the micromachining.•A novel pressure jig to characterize sensors with glue-less fixing.•Sensitivity of 183.10 ± 3.48 mV/mA/MPa for the applied pressure up to...
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Published in | Sensors and actuators. A. Physical. Vol. 316; p. 112372 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Lausanne
Elsevier B.V
01.12.2020
Elsevier BV |
Subjects | |
Online Access | Get full text |
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Summary: | [Display omitted]
•Pressure sensor using nc-Si by Aluminum Induced Crystallization on polyimide.•Novel recipe for device-fabrication bypassing the micromachining.•A novel pressure jig to characterize sensors with glue-less fixing.•Sensitivity of 183.10 ± 3.48 mV/mA/MPa for the applied pressure up to 50 psi.
A flexible pressure sensor fabricated at processing temperatures as low as 300°C using piezoresistive elements of nanocrystalline silicon (nc-Si) on flexible polyimide substrate is reported. Aluminium induced crystallization (AIC) of Hot Wire Chemical Vapour deposited a-Si:H films is used to obtain the nc-Si films with almost 100 % crystalline fraction as revealed by Raman Spectroscopy, and with a measured piezoresistive gauge factor of 41±3. A novel processing method is adopted, wherein the photoresist itself acts as a mask for the transfer of the pattern on the polyimide diaphragm. This enables bypassing the micromachining step, which otherwise is unavoidable for patterning the sensing elements. A full Wheatstone bridge configuration of nc-Si piezoresistors is realized with acceptable linear response of the output signal for an applied pressure range up to 50 psi and the sensitivity is found to be 183.10±3.48 mV/mA/MPa. A novel pressure jig is also designed with the capability to characterize four sensors simultaneously with an arrangement to apply hydrostatic pressure of compressed air. |
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ISSN: | 0924-4247 1873-3069 |
DOI: | 10.1016/j.sna.2020.112372 |