Lithography beyond light: Microcontact printing with monolayer resists

• Published in: IBM journal of research and development Vol. 41; no. 1.2; pp. 159 - 170
• Main Authors: Biebuyck, H. A., Larsen, N. B., Delamarche, E., Michel, B.
• Format: Journal Article
• Language: English
• Published: Armonk International Business Machines Corporation 01.01.1997
• Subjects: Elastomers; Gold; Microscopy; Offset printing; Polymers; R&D; Research & development; Technology

A high-resolution lithography based on the transfer of pattern from an elastomeric `stamp' to a solid substrate through conformal contact is presented. The stamp which was formed by curing poly(dimethyl siloxane) on a master with the negative of the desired surface provides an `ink' that f...