Antisites in III-V semiconductors: Density functional theory calculations
Density functional based simulation, corrected for finite size effects, is used to investigate systematically the formation of antisite defects in III-V semiconductors (III = Al, Ga, and In and V = P, As, and Sb). Different charge states are modelled as a function of the Fermi level and under differ...
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Published in | Journal of applied physics Vol. 116; no. 2 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Melville
American Institute of Physics
14.07.2014
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Subjects | |
Online Access | Get full text |
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Summary: | Density functional based simulation, corrected for finite size effects, is used to investigate systematically the formation of antisite defects in III-V semiconductors (III = Al, Ga, and In and V = P, As, and Sb). Different charge states are modelled as a function of the Fermi level and under different growth conditions. The formation energies of group III antisites (IIIVq) decrease with increasing covalent radius of the group V atom though not group III radius, whereas group V antisites (VIIIq) show a consistent decrease in formation energies with increase in group III and group V covalent radii. In general, IIIVq defects dominate under III-rich conditions and VIIIq under V-rich conditions. Comparison with equivalent vacancy formation energy simulations shows that while antisite concentrations are always dominant under stoichiometric conditions, modest variation in growth or doping conditions can lead to a significantly higher concentration of vacancies. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.4887135 |