Antisites in III-V semiconductors: Density functional theory calculations

Density functional based simulation, corrected for finite size effects, is used to investigate systematically the formation of antisite defects in III-V semiconductors (III = Al, Ga, and In and V = P, As, and Sb). Different charge states are modelled as a function of the Fermi level and under differ...

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Bibliographic Details
Published inJournal of applied physics Vol. 116; no. 2
Main Authors Chroneos, A., Tahini, H. A., Schwingenschlögl, U., Grimes, R. W.
Format Journal Article
LanguageEnglish
Published Melville American Institute of Physics 14.07.2014
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Summary:Density functional based simulation, corrected for finite size effects, is used to investigate systematically the formation of antisite defects in III-V semiconductors (III = Al, Ga, and In and V = P, As, and Sb). Different charge states are modelled as a function of the Fermi level and under different growth conditions. The formation energies of group III antisites (IIIVq) decrease with increasing covalent radius of the group V atom though not group III radius, whereas group V antisites (VIIIq) show a consistent decrease in formation energies with increase in group III and group V covalent radii. In general, IIIVq defects dominate under III-rich conditions and VIIIq under V-rich conditions. Comparison with equivalent vacancy formation energy simulations shows that while antisite concentrations are always dominant under stoichiometric conditions, modest variation in growth or doping conditions can lead to a significantly higher concentration of vacancies.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.4887135