Structural characterization of polycrystalline thin films by X-ray diffraction techniques

• Published in: Journal of materials science. Materials in electronics Vol. 32; no. 2; pp. 1341 - 1368
• Main Authors: Pandey, Akhilesh, Dalal, Sandeep, Dutta, Shankar, Dixit, Ambesh
• Format: Journal Article
• Language: English
• Published: New York Springer US 01.01.2021; Springer Nature B.V
• Subjects: Characterization and Evaluation of Materials; Chemistry and Materials Science; Crystal defects; Crystal structure; Crystallinity; Crystallites; Degree of crystallinity; Depth profiling; Materials Science; Multilayers; Multiphase; Nondestructive testing; Optical and Electronic Materials; Parameters; Polycrystals; Preferred orientation; Review; Structural analysis; Texture; Thin films; X ray powder diffraction; X-ray diffraction

X-ray diffraction (XRD) techniques are powerful, non-destructive characterization tool with minimal sample preparation. XRD provides the first information about the materials phases, crystalline structure, average crystallite size, micro and macro strain, orientation parameter, texture coefficient,...