Structural, plasmonic and electronic properties of zirconium carbonitride thin films prepared by dual ion beam deposition

• Published in: Applied physics. A, Materials science & processing Vol. 129; no. 6
• Main Authors: Liu, Tingting, Ran, Yujing, Wang, Tianrun, Yu, Xiaoting, Hu, Guangxiao, Jiang, Zhaotan, Wang, Zhi
• Format: Journal Article
• Language: English
• Published: Berlin/Heidelberg Springer Berlin Heidelberg 01.06.2023; Springer Nature B.V
• Subjects: Applied physics; Carbon content; Carbon nitride; Carrier density; Characterization and Evaluation of Materials; Condensed Matter Physics; Crystal defects; Deposition; Electron states; Ion beams; Machines; Manufacturing; Materials science; Mathematical analysis; Nanotechnology; Optical and Electronic Materials; Physics; Physics and Astronomy; Plasma frequencies; Plasmonics; Processes; Surfaces and Interfaces; Thin Films; Zirconium carbide; Thin films; Electronic structure; Zirconium carbonitride; Assisting ions; Plasmonic

Metal carbonitride is a new type of tunable plasmonic materials and can be tuned by nitrogen and carbon content. In this work, zirconium carbonitride (ZrC x N y ) thin films are prepared by dual ion beam deposition. The effects of C content and assisting ions on the structure and plasmonic propertie...