Stereometric analysis of TiO2 thin films deposited by electron beam ion assisted

• Published in: Optical and quantum electronics Vol. 52; no. 5
• Main Authors: Shakoury, Reza, Arman, Ali, Ţălu, Ştefan, Dastan, Davoud, Luna, Carlos, Rezaee, Sahar
• Format: Journal Article
• Language: English
• Published: New York Springer US 01.05.2020; Springer Nature B.V
• Subjects: Atomic force microscopy; Characterization and Evaluation of Materials; Computer Communication Networks; Deposition; Electrical Engineering; Electron beams; Energy; Energy gap; Grain size; Ion beams; Lasers; Optical Devices; Optical properties; Optics; Optoelectronic devices; Photonics; Physics; Physics and Astronomy; Spectrum analysis; Surface layers; Surface tension; Thin films; Titanium dioxide; AFM; TiO; 3-D surface microtexture; Stereometric analysis; Optical properties; thin films

The micromorphology and semiconductor properties of TiO 2 thin films growth using different ion beam energies have been finely analyzed using atomic force microscopy (AFM), ultra-violet visible (UV–visible) spectroscopy and stereometric analysis. The AFM measurements and surface stereometric analysi...