APA (7th ed.) Citation

Dastan, D., Shan, K., Jafari, A., Gity, F., Yin, X., Shi, Z., . . . Ansari, L. (2022). Influence of nitrogen concentration on electrical, mechanical, and structural properties of tantalum nitride thin films prepared via DC magnetron sputtering. Applied physics. A, Materials science & processing, 128(5), . https://doi.org/10.1007/s00339-022-05501-4

Chicago Style (17th ed.) Citation

Dastan, Davoud, et al. "Influence of Nitrogen Concentration on Electrical, Mechanical, and Structural Properties of Tantalum Nitride Thin Films Prepared via DC Magnetron Sputtering." Applied Physics. A, Materials Science & Processing 128, no. 5 (2022). https://doi.org/10.1007/s00339-022-05501-4.

MLA (9th ed.) Citation

Dastan, Davoud, et al. "Influence of Nitrogen Concentration on Electrical, Mechanical, and Structural Properties of Tantalum Nitride Thin Films Prepared via DC Magnetron Sputtering." Applied Physics. A, Materials Science & Processing, vol. 128, no. 5, 2022, https://doi.org/10.1007/s00339-022-05501-4.