2D Material Enabled Offset‐Patterning with Atomic Resolution

• Published in: Advanced functional materials Vol. 30; no. 40
• Main Authors: Chen, Szu‐Hua, Hofmann, Mario, Yen, Zhi‐Long, Hsieh, Ya‐Ping
• Format: Journal Article
• Language: English
• Published: Hoboken Wiley Subscription Services, Inc 01.10.2020
• Subjects: 2D material; atomic precision; Bilayers; etch selectivity; Graphene; high resolution lithography; Lithography; Materials science; Nanoribbons; Nanotechnology; Offsets; Substrates; Two dimensional materials

Atomic‐precision patterning at large scale is a central requirement for nanotechnology and future electronics that is hindered by the limitations of lithographical techniques. Historically, imperfections of the fabrication tools have been compensated by multi‐patterning using sequential lithography...