Multifractal and optical bandgap characterization of Ta2O5 thin films deposited by electron gun method

• Published in: Optical and quantum electronics Vol. 52; no. 2
• Main Authors: Shakoury, Reza, Rezaee, Sahar, Mwema, Fredrick, Luna, Carlos, Ghosh, Koushik, Jurečka, Stanislav, Ţălu, Ştefan, Arman, Ali, Grayeli Korpi, Alireza
• Format: Journal Article
• Language: English
• Published: New York Springer US 01.02.2020; Springer Nature B.V
• Subjects: Atomic force microscopy; Characterization and Evaluation of Materials; Computer Communication Networks; Electrical Engineering; Electron guns; Film thickness; Glass substrates; Lasers; Microtexture; Optical Devices; Optics; Photonics; Physics; Physics and Astronomy; Refractivity; Spectroellipsometry; Spectrophotometry; Tantalum; Tantalum oxides; Thin films; Atomic force microscopy; Optical properties; Electron gun method; Multifractal analysis; Ta; O; thin films

The micromorphology of tantalum pentoxide (Ta 2 O 5 ) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10 −6 mbar, work pres...