Multifractal and optical bandgap characterization of Ta2O5 thin films deposited by electron gun method
The micromorphology of tantalum pentoxide (Ta 2 O 5 ) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10 −6 mbar, work pres...
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Published in | Optical and quantum electronics Vol. 52; no. 2 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
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01.02.2020
Springer Nature B.V |
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Abstract | The micromorphology of tantalum pentoxide (Ta
2
O
5
) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10
−6
mbar, work pressures of 1.3 × 10
−4
and 2.0 × 10
−4
mbar, and thicknesses of 0.38 μm and 0.39 μm, respectively. Subsequently, these samples were annealed at 300 °C for 2 h. The physical, structural and optical analyses were investigated by spectroscopic ellipsometry, spectrophotometry and AFM. The measured transmittance spectra were studied based on the Swanepoel method, whose results also yielded to the estimation of the film thickness and the refractive index. Finally, Ta
2
O
5
thin films were characterized by AFM measurements and multifractal analyses for an accurate description of the 3-D surface microtexture features. The fractal examinations of the samples revealed that these microstructures exhibit multifractal characteristics. Essential parameters that characterized the thin films were compared and discussed thoroughly. |
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AbstractList | The micromorphology of tantalum pentoxide (Ta2O5) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10−6 mbar, work pressures of 1.3 × 10−4 and 2.0 × 10−4 mbar, and thicknesses of 0.38 μm and 0.39 μm, respectively. Subsequently, these samples were annealed at 300 °C for 2 h. The physical, structural and optical analyses were investigated by spectroscopic ellipsometry, spectrophotometry and AFM. The measured transmittance spectra were studied based on the Swanepoel method, whose results also yielded to the estimation of the film thickness and the refractive index. Finally, Ta2O5 thin films were characterized by AFM measurements and multifractal analyses for an accurate description of the 3-D surface microtexture features. The fractal examinations of the samples revealed that these microstructures exhibit multifractal characteristics. Essential parameters that characterized the thin films were compared and discussed thoroughly. The micromorphology of tantalum pentoxide (Ta 2 O 5 ) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10 −6 mbar, work pressures of 1.3 × 10 −4 and 2.0 × 10 −4 mbar, and thicknesses of 0.38 μm and 0.39 μm, respectively. Subsequently, these samples were annealed at 300 °C for 2 h. The physical, structural and optical analyses were investigated by spectroscopic ellipsometry, spectrophotometry and AFM. The measured transmittance spectra were studied based on the Swanepoel method, whose results also yielded to the estimation of the film thickness and the refractive index. Finally, Ta 2 O 5 thin films were characterized by AFM measurements and multifractal analyses for an accurate description of the 3-D surface microtexture features. The fractal examinations of the samples revealed that these microstructures exhibit multifractal characteristics. Essential parameters that characterized the thin films were compared and discussed thoroughly. |
ArticleNumber | 95 |
Author | Ghosh, Koushik Shakoury, Reza Ţălu, Ştefan Mwema, Fredrick Luna, Carlos Jurečka, Stanislav Arman, Ali Grayeli Korpi, Alireza Rezaee, Sahar |
Author_xml | – sequence: 1 givenname: Reza surname: Shakoury fullname: Shakoury, Reza organization: Department of Physics, Faculty of Science, Imam Khomeini International University – sequence: 2 givenname: Sahar orcidid: 0000-0001-5034-0810 surname: Rezaee fullname: Rezaee, Sahar email: Saharrezaee593@iauksh.ac.ir organization: Department of Physics, Kermanshah Branch, Islamic Azad University – sequence: 3 givenname: Fredrick orcidid: 0000-0001-6116-5587 surname: Mwema fullname: Mwema, Fredrick organization: Mechanical Engineering Science, University of Johannesburg, Department of Mechanical Engineering, Dedan Kimathi University of Technology – sequence: 4 givenname: Carlos orcidid: 0000-0002-0149-9814 surname: Luna fullname: Luna, Carlos organization: Facultad de Ciencias Físico Matemáticas (FCFM), Universidad Autónoma de Nuevo León (UANL) – sequence: 5 givenname: Koushik orcidid: 0000-0002-3208-1015 surname: Ghosh fullname: Ghosh, Koushik organization: Department of Pure and Applied Physics, Guru Ghasidas Vishwavidyalaya – sequence: 6 givenname: Stanislav surname: Jurečka fullname: Jurečka, Stanislav organization: Institute of Aurel Stodola, Faculty of Electrical Engineering, University of Žilina – sequence: 7 givenname: Ştefan orcidid: 0000-0003-1311-7657 surname: Ţălu fullname: Ţălu, Ştefan organization: The Directorate of Research, Development and Innovation Management (DMCDI), Technical University of Cluj-Napoca – sequence: 8 givenname: Ali orcidid: 0000-0003-1246-0453 surname: Arman fullname: Arman, Ali organization: ACECR, Institute of Technology Development, Sharif University Branch – sequence: 9 givenname: Alireza surname: Grayeli Korpi fullname: Grayeli Korpi, Alireza organization: Physics and Accelerators Research School, Nuclear Sciences and Technology Research Institute |
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Keywords | Atomic force microscopy Optical properties Electron gun method Multifractal analysis Ta O thin films |
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Snippet | The micromorphology of tantalum pentoxide (Ta
2
O
5
) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force... The micromorphology of tantalum pentoxide (Ta2O5) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force... |
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SubjectTerms | Atomic force microscopy Characterization and Evaluation of Materials Computer Communication Networks Electrical Engineering Electron guns Film thickness Glass substrates Lasers Microtexture Optical Devices Optics Photonics Physics Physics and Astronomy Refractivity Spectroellipsometry Spectrophotometry Tantalum Tantalum oxides Thin films |
Title | Multifractal and optical bandgap characterization of Ta2O5 thin films deposited by electron gun method |
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