Multifractal and optical bandgap characterization of Ta2O5 thin films deposited by electron gun method

The micromorphology of tantalum pentoxide (Ta 2 O 5 ) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10 −6 mbar, work pres...

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Published inOptical and quantum electronics Vol. 52; no. 2
Main Authors Shakoury, Reza, Rezaee, Sahar, Mwema, Fredrick, Luna, Carlos, Ghosh, Koushik, Jurečka, Stanislav, Ţălu, Ştefan, Arman, Ali, Grayeli Korpi, Alireza
Format Journal Article
LanguageEnglish
Published New York Springer US 01.02.2020
Springer Nature B.V
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Abstract The micromorphology of tantalum pentoxide (Ta 2 O 5 ) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10 −6 mbar, work pressures of 1.3 × 10 −4 and 2.0 × 10 −4 mbar, and thicknesses of 0.38 μm and 0.39 μm, respectively. Subsequently, these samples were annealed at 300 °C for 2 h. The physical, structural and optical analyses were investigated by spectroscopic ellipsometry, spectrophotometry and AFM. The measured transmittance spectra were studied based on the Swanepoel method, whose results also yielded to the estimation of the film thickness and the refractive index. Finally, Ta 2 O 5 thin films were characterized by AFM measurements and multifractal analyses for an accurate description of the 3-D surface microtexture features. The fractal examinations of the samples revealed that these microstructures exhibit multifractal characteristics. Essential parameters that characterized the thin films were compared and discussed thoroughly.
AbstractList The micromorphology of tantalum pentoxide (Ta2O5) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10−6 mbar, work pressures of 1.3 × 10−4 and 2.0 × 10−4 mbar, and thicknesses of 0.38 μm and 0.39 μm, respectively. Subsequently, these samples were annealed at 300 °C for 2 h. The physical, structural and optical analyses were investigated by spectroscopic ellipsometry, spectrophotometry and AFM. The measured transmittance spectra were studied based on the Swanepoel method, whose results also yielded to the estimation of the film thickness and the refractive index. Finally, Ta2O5 thin films were characterized by AFM measurements and multifractal analyses for an accurate description of the 3-D surface microtexture features. The fractal examinations of the samples revealed that these microstructures exhibit multifractal characteristics. Essential parameters that characterized the thin films were compared and discussed thoroughly.
The micromorphology of tantalum pentoxide (Ta 2 O 5 ) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry and multifractal analyses. Two samples were grown at basic pressure of 7 × 10 −6 mbar, work pressures of 1.3 × 10 −4 and 2.0 × 10 −4 mbar, and thicknesses of 0.38 μm and 0.39 μm, respectively. Subsequently, these samples were annealed at 300 °C for 2 h. The physical, structural and optical analyses were investigated by spectroscopic ellipsometry, spectrophotometry and AFM. The measured transmittance spectra were studied based on the Swanepoel method, whose results also yielded to the estimation of the film thickness and the refractive index. Finally, Ta 2 O 5 thin films were characterized by AFM measurements and multifractal analyses for an accurate description of the 3-D surface microtexture features. The fractal examinations of the samples revealed that these microstructures exhibit multifractal characteristics. Essential parameters that characterized the thin films were compared and discussed thoroughly.
ArticleNumber 95
Author Ghosh, Koushik
Shakoury, Reza
Ţălu, Ştefan
Mwema, Fredrick
Luna, Carlos
Jurečka, Stanislav
Arman, Ali
Grayeli Korpi, Alireza
Rezaee, Sahar
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Issue 2
Keywords Atomic force microscopy
Optical properties
Electron gun method
Multifractal analysis
Ta
O
thin films
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Springer Nature B.V
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Snippet The micromorphology of tantalum pentoxide (Ta 2 O 5 ) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force...
The micromorphology of tantalum pentoxide (Ta2O5) thin films, deposited on glass substrates by electron gun method, has been analyzed using atomic force...
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SubjectTerms Atomic force microscopy
Characterization and Evaluation of Materials
Computer Communication Networks
Electrical Engineering
Electron guns
Film thickness
Glass substrates
Lasers
Microtexture
Optical Devices
Optics
Photonics
Physics
Physics and Astronomy
Refractivity
Spectroellipsometry
Spectrophotometry
Tantalum
Tantalum oxides
Thin films
Title Multifractal and optical bandgap characterization of Ta2O5 thin films deposited by electron gun method
URI https://link.springer.com/article/10.1007/s11082-019-2173-5
https://www.proquest.com/docview/2348263386
Volume 52
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