Luminescence of F-Type Defects and Their Thermal Stability in Sapphire Irradiated by Pulsed Ion Beams

We studied the luminescence and the thermal stability of defects formed in α-Al 2 O 3 single crystals after pulsed treatment with a beam of C + /H + ions with an energy of 300 keV and a pulse duration of ~80 ns. By measuring optical absorption, photoluminescence, and pulsed cathodoluminescence, it i...

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Published inOptics and spectroscopy Vol. 128; no. 2; pp. 207 - 213
Main Authors Ananchenko, D. V., Nikiforov, S. V., Ramazanova, G. R., Batalov, R. I., Bayazitov, R. M., Novikov, H. A.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 01.02.2020
Springer Nature B.V
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Summary:We studied the luminescence and the thermal stability of defects formed in α-Al 2 O 3 single crystals after pulsed treatment with a beam of C + /H + ions with an energy of 300 keV and a pulse duration of ~80 ns. By measuring optical absorption, photoluminescence, and pulsed cathodoluminescence, it is found that this type of exposure leads to intense generation of both single F and F + centers and more complex defects ( F 2  aggregate centers or vacancy–impurity complexes) in α-Al 2 O 3 . The thermal stability of F -type defects formed in α-Al 2 O 3 upon exposure to a pulsed ion beam is comparable to the stability of radiation-induced defects in neutron-irradiated samples.
ISSN:0030-400X
1562-6911
DOI:10.1134/S0030400X20020022