Surface roughness of optical quartz substrate by chemical mechanical polishing - 段波 周建伟 刘玉岭 孙铭斌 张玉峰 (Journal of semiconductors, 2014)
Keywords: Flow rate; Mechanical polishing; Platens; Polishing; Semiconductors; Slurries; Surface roughness; Titanium dioxide; 二氧化钛; 光学; 减反射膜; 化学机械抛光; 工艺参数; 玻璃基板; 石英衬底; 表面粗糙度