Field emissions of graphene films deposited on different substrates by CVD system

Graphene films are deposited on copper （Cu） and aluminum （Al） substrates, respectively, by using a microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a field emission type scanning electron microscope （FE-SEM）, Raman spectra, and field emiss...

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Published inChinese physics B Vol. 21; no. 12; pp. 499 - 502
Main Author 王小平 刘晓菲 刘欣欣 王丽军 杨灿 井龙伟 李松坤 潘秀芳
Format Journal Article
LanguageEnglish
Published 01.12.2012
Subjects
Aluminum
Chemical vapor deposition
Copper
CVD
Deposition
FE-SEM
Field emission
Graphene
Microwave plasmas
Raman spectra
Scanning electron microscopy
场发射性能
电子显微镜
石墨
系统
薄膜沉积
衬底
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Summary:Graphene films are deposited on copper （Cu） and aluminum （Al） substrates, respectively, by using a microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a field emission type scanning electron microscope （FE-SEM）, Raman spectra, and field emission （FE） I-V measurements. It is found that the surface morphologies of the films deposited on Cu and Al substrates are different： the field emission property of graphene film deposited on the Cu substrate is better than that on the Al substrate, and the lowest turn-on field of 2.4 V/p-m is obtained for graphene film deposited on the Cu substrate. The macroscopic areas of the graphene samples are all above 400 mm2.
Bibliography:Graphene films are deposited on copper （Cu） and aluminum （Al） substrates, respectively, by using a microwave plasma chemical vapour deposition technique. Furthermore, these graphene films are characterized by a field emission type scanning electron microscope （FE-SEM）, Raman spectra, and field emission （FE） I-V measurements. It is found that the surface morphologies of the films deposited on Cu and Al substrates are different： the field emission property of graphene film deposited on the Cu substrate is better than that on the Al substrate, and the lowest turn-on field of 2.4 V/p-m is obtained for graphene film deposited on the Cu substrate. The macroscopic areas of the graphene samples are all above 400 mm2.
graphene, chemical vapour deposition, field emission
11-5639/O4
Wang Xiao-Ping, Liu Xiao-Fei, Liu Xin-Xin Wang Li-Jun, Yang Can, Jing Long-Wei, Li Song-Kun, and Pan Xiu-Fang College of Science, University of Shanghai for Science and Technology, Shanghai 200093, China
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:1674-1056
2058-3834
1741-4199
DOI:10.1088/1674-1056/21/12/128102