Quantitative analysis of the polishing performance of Wurtzite-SiC surface texture on surface quality and material removal rate

• Published in: Tribology international Vol. 199; p. 110020
• Main Authors: Do, Tan-Tai, Le, Phu-Cuong, Fang, Te-Hua
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.11.2024
• Subjects: Material removal mechanism; Nano-textured; Polishing; Surface roughness; Polishing; Material removal mechanism; Surface roughness; Nano-textured

Molecular dynamics simulation is used to study Wurtzite-SiC's structural changes after polishing process. For realistic planarization conditions, various surface-textured structures are also used. Polishing speed greatly impacts dislocation distribution. Increasing velocity to 2 Å/ps reduces di...