Polishing-induced material attrition in surface-texturing AlN using a nanoscale polishing tool: An atomic-scale understanding

• Published in: Tribology international Vol. 192; p. 109254
• Main Authors: Le, Phu-Cuong, Do, Tan-Tai, Fang, Te-Hua, Lee, Chun-I.
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.04.2024
• Subjects: Material removal mechanism; Nano-polishing; Nano-textured; Surface roughness; Material removal mechanism; Surface roughness; Nano-polishing; Nano-textured

This study examines the alterations in the material properties and the effectiveness of the nano-polishing process applied to the surface of AlN substrate material through molecular dynamics simulations. Various controlled parameters at the outset of the polishing process, including polishing depth,...