Degradation mechanism in carbon-doped GaAs minority-carrier injection devices [HBTs]
Degradation behavior and mechanism of GaAs-based devices under minority-carrier injection has been studied by measuring the increase in the leakage current and the luminescence lifetime of minority carriers. It is found that hydrogen unintentionally incorporated in GaAs-based devices induces degrada...
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Published in | IEEE transactions on electron devices Vol. 44; no. 11; pp. 1996 - 2001 |
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Main Authors | , |
Format | Journal Article |
Language | English |
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IEEE
01.11.1997
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Abstract | Degradation behavior and mechanism of GaAs-based devices under minority-carrier injection has been studied by measuring the increase in the leakage current and the luminescence lifetime of minority carriers. It is found that hydrogen unintentionally incorporated in GaAs-based devices induces degradation under minority-carrier injection, i.e., increase in injection leakage current at low bias voltage. "Isolated" hydrogen donors (H/sup +/) induce rapid degradation, and even carbon-hydrogen (C-H) complexes which are believed to be electrically neutral induce slow degradation. Degradation is induced by the decomposition of the C-H complexes, enhanced by minority-carrier injection producing electrically active isolated hydrogen donors (H/sup +/). The kinetics of the leakage current increase are well explained by the decomposition kinetics of the C-H complexes. Under minority-carrier injection, H/sup +/ changes to hydrogen acceptors (H/sup - /) by capturing two electrons. Hydrogen donors (H/sup +/) and hydrogen acceptors (H/sup -/) combine and become a molecular hydrogen which Is thought to form {111} platelets. This decomposition mechanism are not due to recombination-enhanced defect reaction (REDR) but is related to charge state effects by two-electron capturing. We infer that the degradation mechanism is closely related to the leakage through the {111} platelets. |
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AbstractList | Degradation behavior and mechanism of GaAs-based devices under minority-carrier injection has been studied by measuring the increase in the leakage current and the luminescence lifetime of minority carriers. It is found that hydrogen unintentionally incorporated in GaAs-based devices induces degradation under minority-carrier injection, i.e., increase in injection leakage current at low bias voltage. "Isolated" hydrogen donors (H/sup +/) induce rapid degradation, and even carbon-hydrogen (C-H) complexes which are believed to be electrically neutral induce slow degradation. Degradation is induced by the decomposition of the C-H complexes, enhanced by minority-carrier injection producing electrically active isolated hydrogen donors (H/sup +/). The kinetics of the leakage current increase are well explained by the decomposition kinetics of the C-H complexes. Under minority-carrier injection, H/sup +/ changes to hydrogen acceptors (H/sup - /) by capturing two electrons. Hydrogen donors (H/sup +/) and hydrogen acceptors (H/sup -/) combine and become a molecular hydrogen which Is thought to form {111} platelets. This decomposition mechanism are not due to recombination-enhanced defect reaction (REDR) but is related to charge state effects by two-electron capturing. We infer that the degradation mechanism is closely related to the leakage through the {111} platelets. |
Author | Wada, K. Fushimi, H. |
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CitedBy_id | crossref_primary_10_1016_j_pquantelec_2020_100303 crossref_primary_10_1063_1_371710 crossref_primary_10_1016_S0026_2714_03_00068_4 crossref_primary_10_1016_S0026_2714_99_00188_2 crossref_primary_10_1016_S0921_5107_00_00654_1 crossref_primary_10_1109_55_728895 crossref_primary_10_1109_LED_2003_813360 crossref_primary_10_1063_1_1640790 crossref_primary_10_1541_ieejeiss_128_838 crossref_primary_10_1002_ecj_10208 crossref_primary_10_1063_1_1500417 crossref_primary_10_1016_S0038_1101_98_00169_5 crossref_primary_10_1088_1361_6641_aa729b crossref_primary_10_1143_JJAP_46_974 crossref_primary_10_1016_j_mejo_2005_12_002 crossref_primary_10_1016_j_jcrysgro_2009_10_012 crossref_primary_10_1103_PhysRevB_60_15117 crossref_primary_10_1109_TCAPT_2004_827642 |
Cites_doi | 10.1063/1.105623 10.1143/JJAP.31.2343 10.4028/www.scientific.net/MSF.196-201.957 10.1016/0921-5107(94)90059-0 10.1016/0022-0248(94)91086-3 10.1109/55.82083 10.1016/0038-1101(78)90215-0 10.1109/GAAS.1993.394489 10.1016/0921-5107(94)90054-X 10.1063/1.105635 10.1143/JJAP.31.751 10.1109/16.216421 10.4028/www.scientific.net/MSF.143-147.897 10.1109/IEDM.1990.237110 10.1063/1.102497 10.1063/1.105454 10.1063/1.346315 10.4028/www.scientific.net/MSF.196-201.951 10.1103/PhysRevB.45.11379 10.1063/1.352902 10.1109/16.40886 10.1063/1.105025 10.1103/PhysRevLett.58.1755 10.1063/1.103817 10.1103/PhysRevB.43.4361 |
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SubjectTerms | Current measurement Degradation Electrons Gallium arsenide Hydrogen Kinetic theory Leakage current Low voltage Luminescence Spontaneous emission |
Title | Degradation mechanism in carbon-doped GaAs minority-carrier injection devices [HBTs] |
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