Degradation mechanism in carbon-doped GaAs minority-carrier injection devices [HBTs]

Degradation behavior and mechanism of GaAs-based devices under minority-carrier injection has been studied by measuring the increase in the leakage current and the luminescence lifetime of minority carriers. It is found that hydrogen unintentionally incorporated in GaAs-based devices induces degrada...

Full description

Saved in:
Bibliographic Details
Published inIEEE transactions on electron devices Vol. 44; no. 11; pp. 1996 - 2001
Main Authors Fushimi, H., Wada, K.
Format Journal Article
LanguageEnglish
Published IEEE 01.11.1997
Subjects
Online AccessGet full text

Cover

Loading…
Abstract Degradation behavior and mechanism of GaAs-based devices under minority-carrier injection has been studied by measuring the increase in the leakage current and the luminescence lifetime of minority carriers. It is found that hydrogen unintentionally incorporated in GaAs-based devices induces degradation under minority-carrier injection, i.e., increase in injection leakage current at low bias voltage. "Isolated" hydrogen donors (H/sup +/) induce rapid degradation, and even carbon-hydrogen (C-H) complexes which are believed to be electrically neutral induce slow degradation. Degradation is induced by the decomposition of the C-H complexes, enhanced by minority-carrier injection producing electrically active isolated hydrogen donors (H/sup +/). The kinetics of the leakage current increase are well explained by the decomposition kinetics of the C-H complexes. Under minority-carrier injection, H/sup +/ changes to hydrogen acceptors (H/sup - /) by capturing two electrons. Hydrogen donors (H/sup +/) and hydrogen acceptors (H/sup -/) combine and become a molecular hydrogen which Is thought to form {111} platelets. This decomposition mechanism are not due to recombination-enhanced defect reaction (REDR) but is related to charge state effects by two-electron capturing. We infer that the degradation mechanism is closely related to the leakage through the {111} platelets.
AbstractList Degradation behavior and mechanism of GaAs-based devices under minority-carrier injection has been studied by measuring the increase in the leakage current and the luminescence lifetime of minority carriers. It is found that hydrogen unintentionally incorporated in GaAs-based devices induces degradation under minority-carrier injection, i.e., increase in injection leakage current at low bias voltage. "Isolated" hydrogen donors (H/sup +/) induce rapid degradation, and even carbon-hydrogen (C-H) complexes which are believed to be electrically neutral induce slow degradation. Degradation is induced by the decomposition of the C-H complexes, enhanced by minority-carrier injection producing electrically active isolated hydrogen donors (H/sup +/). The kinetics of the leakage current increase are well explained by the decomposition kinetics of the C-H complexes. Under minority-carrier injection, H/sup +/ changes to hydrogen acceptors (H/sup - /) by capturing two electrons. Hydrogen donors (H/sup +/) and hydrogen acceptors (H/sup -/) combine and become a molecular hydrogen which Is thought to form {111} platelets. This decomposition mechanism are not due to recombination-enhanced defect reaction (REDR) but is related to charge state effects by two-electron capturing. We infer that the degradation mechanism is closely related to the leakage through the {111} platelets.
Author Wada, K.
Fushimi, H.
Author_xml – sequence: 1
  givenname: H.
  surname: Fushimi
  fullname: Fushimi, H.
  organization: NTT Syst. Electron. Labs., Kanagawa, Japan
– sequence: 2
  givenname: K.
  surname: Wada
  fullname: Wada, K.
BookMark eNo9kD1PwzAYhC1UJNrCwMqUlcHFjj-SjKVAi1SJJUwIRe7r1-CKOJUdIfXfE0jFdDrdczfcjExCF5CQa84WnLPqjuuFllwU_IxMuVIFrbTUEzJljJe0EqW4ILOU9oPVUuZTUj_gRzTW9L4LWYvwaYJPbeZDBibuukBtd0Cbrc0yZa0PXfT9kQ5R9BgHao_w17T47QFT9ra5r9P7JTl35ivh1Unn5PXpsV5t6PZl_bxabikInvc0r6wDEFKDdZaVJSBYq0yprMm1ZMZIVklTOAVO8l2RF0xYkJVQTEpRKhBzcjvuQuxSiuiaQ_SticeGs-b3jobrZrxjYG9G1iPiP3cKfwB-1FzJ
CODEN IETDAI
CitedBy_id crossref_primary_10_1016_j_pquantelec_2020_100303
crossref_primary_10_1063_1_371710
crossref_primary_10_1016_S0026_2714_03_00068_4
crossref_primary_10_1016_S0026_2714_99_00188_2
crossref_primary_10_1016_S0921_5107_00_00654_1
crossref_primary_10_1109_55_728895
crossref_primary_10_1109_LED_2003_813360
crossref_primary_10_1063_1_1640790
crossref_primary_10_1541_ieejeiss_128_838
crossref_primary_10_1002_ecj_10208
crossref_primary_10_1063_1_1500417
crossref_primary_10_1016_S0038_1101_98_00169_5
crossref_primary_10_1088_1361_6641_aa729b
crossref_primary_10_1143_JJAP_46_974
crossref_primary_10_1016_j_mejo_2005_12_002
crossref_primary_10_1016_j_jcrysgro_2009_10_012
crossref_primary_10_1103_PhysRevB_60_15117
crossref_primary_10_1109_TCAPT_2004_827642
Cites_doi 10.1063/1.105623
10.1143/JJAP.31.2343
10.4028/www.scientific.net/MSF.196-201.957
10.1016/0921-5107(94)90059-0
10.1016/0022-0248(94)91086-3
10.1109/55.82083
10.1016/0038-1101(78)90215-0
10.1109/GAAS.1993.394489
10.1016/0921-5107(94)90054-X
10.1063/1.105635
10.1143/JJAP.31.751
10.1109/16.216421
10.4028/www.scientific.net/MSF.143-147.897
10.1109/IEDM.1990.237110
10.1063/1.102497
10.1063/1.105454
10.1063/1.346315
10.4028/www.scientific.net/MSF.196-201.951
10.1103/PhysRevB.45.11379
10.1063/1.352902
10.1109/16.40886
10.1063/1.105025
10.1103/PhysRevLett.58.1755
10.1063/1.103817
10.1103/PhysRevB.43.4361
ContentType Journal Article
DBID AAYXX
CITATION
DOI 10.1109/16.641371
DatabaseName CrossRef
DatabaseTitle CrossRef
DatabaseTitleList
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
EISSN 1557-9646
EndPage 2001
ExternalDocumentID 10_1109_16_641371
641371
GroupedDBID -~X
.DC
0R~
29I
3EH
4.4
5GY
5VS
6IK
97E
AAJGR
AASAJ
ABQJQ
ABVLG
ACGFO
ACGFS
ACIWK
ACKIV
ACNCT
AENEX
AETIX
AI.
AIBXA
AKJIK
ALLEH
ALMA_UNASSIGNED_HOLDINGS
ASUFR
ATWAV
B-7
BEFXN
BFFAM
BGNUA
BKEBE
BPEOZ
CS3
DU5
EBS
EJD
F5P
HZ~
H~9
IAAWW
IBMZZ
ICLAB
IDIHD
IFIPE
IFJZH
IPLJI
JAVBF
LAI
M43
MS~
O9-
OCL
P2P
RIA
RIE
RIG
RNS
TAE
TN5
VH1
VJK
VOH
XFK
AAYXX
CITATION
ID FETCH-LOGICAL-c312t-29dfcc346cdfd088cecdd5a85da2640aa4094a7f5cf41b72703dc4935044385c3
IEDL.DBID RIE
ISSN 0018-9383
IngestDate Fri Aug 23 01:23:30 EDT 2024
Wed Jun 26 19:31:20 EDT 2024
IsPeerReviewed true
IsScholarly true
Issue 11
Language English
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-c312t-29dfcc346cdfd088cecdd5a85da2640aa4094a7f5cf41b72703dc4935044385c3
PageCount 6
ParticipantIDs crossref_primary_10_1109_16_641371
ieee_primary_641371
PublicationCentury 1900
PublicationDate 1997-11-01
PublicationDateYYYYMMDD 1997-11-01
PublicationDate_xml – month: 11
  year: 1997
  text: 1997-11-01
  day: 01
PublicationDecade 1990
PublicationTitle IEEE transactions on electron devices
PublicationTitleAbbrev TED
PublicationYear 1997
Publisher IEEE
Publisher_xml – name: IEEE
References ref13
ref12
ref15
ref14
ref11
ref10
ref2
ref1
ref17
ref16
ref19
ref18
ref24
ref23
ref25
ref20
ref22
ref21
ref8
ref7
ref9
ref4
ref3
ref6
ref5
References_xml – ident: ref5
  doi: 10.1063/1.105623
– ident: ref7
  doi: 10.1143/JJAP.31.2343
– ident: ref14
  doi: 10.4028/www.scientific.net/MSF.196-201.957
– ident: ref9
  doi: 10.1016/0921-5107(94)90059-0
– ident: ref16
  doi: 10.1016/0022-0248(94)91086-3
– ident: ref8
  doi: 10.1109/55.82083
– ident: ref22
  doi: 10.1016/0038-1101(78)90215-0
– ident: ref23
  doi: 10.1109/GAAS.1993.394489
– ident: ref25
  doi: 10.1016/0921-5107(94)90054-X
– ident: ref13
  doi: 10.1063/1.105635
– ident: ref4
  doi: 10.1143/JJAP.31.751
– ident: ref3
  doi: 10.1109/16.216421
– ident: ref24
  doi: 10.4028/www.scientific.net/MSF.143-147.897
– ident: ref2
  doi: 10.1109/IEDM.1990.237110
– ident: ref20
  doi: 10.1063/1.102497
– ident: ref15
  doi: 10.1063/1.105454
– ident: ref21
  doi: 10.1063/1.346315
– ident: ref17
  doi: 10.4028/www.scientific.net/MSF.196-201.951
– ident: ref19
  doi: 10.1103/PhysRevB.45.11379
– ident: ref10
  doi: 10.1063/1.352902
– ident: ref1
  doi: 10.1109/16.40886
– ident: ref6
  doi: 10.1063/1.105025
– ident: ref12
  doi: 10.1103/PhysRevLett.58.1755
– ident: ref11
  doi: 10.1063/1.103817
– ident: ref18
  doi: 10.1103/PhysRevB.43.4361
SSID ssj0016442
Score 1.6639272
Snippet Degradation behavior and mechanism of GaAs-based devices under minority-carrier injection has been studied by measuring the increase in the leakage current and...
SourceID crossref
ieee
SourceType Aggregation Database
Publisher
StartPage 1996
SubjectTerms Current measurement
Degradation
Electrons
Gallium arsenide
Hydrogen
Kinetic theory
Leakage current
Low voltage
Luminescence
Spontaneous emission
Title Degradation mechanism in carbon-doped GaAs minority-carrier injection devices [HBTs]
URI https://ieeexplore.ieee.org/document/641371
Volume 44
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV1bS8MwFA66J33wMhXnjSC-puslydrHeZlD0KcNBiIlzUlgytqxdi_-enOZY4oPvpU0peUknHyn53zfQeimJ4sk1SmQBEJNqDZxSgaaklRCIXgcyjiybOTnFz4c06cJm6x0th0XRinlis9UYC9dLh8qubS_yrrceFzLF9_uZZmnaq0TBuZY98LgkXmZibpWIkJRmHUjHvgHfxw9G71U3FEy2Pcc7dopENoKko9g2RSB_Pylz_jPrzxAeytIift-DxyiLVW20e6G0OARGt1bTQjfPgnPlGX7TusZnpZYikVRlQSquQL8KPo1nk3Lyna0I-aWbWdnZr27eq0Sg3J-Bb8Ob0f12zEaDx5Gd0Oy6qdAZBLFDYnNKkiZUC5Bg_EuUkkAJlIGwsCiUAgb64meZlLTqDDAJkxA0ixhIaVJymRyglplVapThA1o5MBsmlcbPMWzlILiWkkBkQEwwDro-tvU-dzLZuQu3AizPOK5N1EHta311hP86Nmfo-doxwnHOhbgBWo1i6W6NHCgKa7cRvgCcB60Jg
link.rule.ids 315,783,787,799,27937,27938,55087
linkProvider IEEE
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwjV3JTsMwELVQOQAHlgKirBbi6jaL4ybHspQCbU-tVAmhyPHYUkFNqja98PV4KVVBHLhFjqNEY2v8JjPvDUI3TZGFsYqBhOApQpWOUxJQlMQCMs4CTwS-YSP3-qwzpM-jaLTU2bZcGCmlLT6TdXNpc_lQiIX5VdZg2uMavvimhtVx05G1VikDfbA7aXBfv07HXUsZId9LGj6ru0d_HD5r3VTsYdLecyztudUgNDUkH_VFmdXF5y-Fxn9-5z7aXYJK3HK74ABtyLyKdtakBg_R4N6oQrgGSngiDd93PJ_gcY4Fn2VFTqCYSsCPvDXHk3FemJ52RN8yDe30rHdbsZVjkNaz4NfO7WD-doSG7YfBXYcsOyoQEfpBSQK9DkKElAlQoP2LkAIg4nEEXAMjj3MT7fGmioSifqahjReCoEkYeZSGcSTCY1TJi1yeIKxhI4PIJHqVRlQsiSlIpqTg4GsIA1ENXX-bOp064YzUBhxekvosdSaqoaqx3mqCGz39c_QKbXUGvW7afeq_nKFtKyNrOYHnqFLOFvJCg4Myu7Sb4gsLgLdy
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Degradation+mechanism+in+carbon-doped+GaAs+minority-carrier+injection+devices+%5BHBTs%5D&rft.jtitle=IEEE+transactions+on+electron+devices&rft.au=Fushimi%2C+H.&rft.au=Wada%2C+K.&rft.date=1997-11-01&rft.issn=0018-9383&rft.volume=44&rft.issue=11&rft.spage=1996&rft.epage=2001&rft_id=info:doi/10.1109%2F16.641371&rft.externalDBID=n%2Fa&rft.externalDocID=10_1109_16_641371
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0018-9383&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0018-9383&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0018-9383&client=summon