Improving Thickness Uniformity of Mo/Si Multilayers on Curved Spherical Substrates by a Masking Technique

• Published in: Coatings (Basel) Vol. 9; no. 12; p. 851
• Main Authors: Zhang, Zhe, Qi, Runze, Yao, Yiyun, Shi, Yingna, Li, Wenbin, Huang, Qiushi, Yi, Shengzhen, Zhang, Zhong, Wang, Zhanshan, Xie, Chun
• Format: Journal Article
• Language: English
• Published: Basel MDPI AG 2019
• Subjects: Bandwidths; Deviation; Direct current; Experiments; Laboratories; Magnetron sputtering; Masking; Microscopes; Motion systems; Multilayers; Nonuniformity; Numerical aperture; Planetary rotation; Radiation; Radius of curvature; Shadow masks; Telescopes; Thickness measurement

In this work, a masking technique was used to improve the thickness uniformity of a Mo/Si multilayer deposited on a curved spherical mirror by direct current (DC) magnetron sputtering with planetary rotation stages. The clear aperture of the mirror was 125 mm with a radius of curvature equal to 143....