Microstructure, mechanical, and electrochemical properties of Si/DLC coating deposited on 2024-T3 Al alloy
This work evaluated the microstructure, mechanical, and electrochemical properties of Si/DLC coatings deposited using the plasma-enhanced chemical vapor deposition (PECVD) technique. Tetramethylsilane and acetylene were used as precursor gases in the deposition process. The characteristics of the...
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Published in | Journal of alloys and compounds Vol. 966; p. 171452 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
05.12.2023
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Subjects | |
Online Access | Get full text |
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