Microstructure, mechanical, and electrochemical properties of Si/DLC coating deposited on 2024-T3 Al alloy

This work evaluated the microstructure, mechanical, and electrochemical properties of Si/DLC coatings deposited using ‎ the plasma-enhanced chemical vapor deposition (PECVD) technique. Tetramethylsilane and acetylene were used as precursor gases in the deposition process. The characteristics of the...

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Bibliographic Details
Published inJournal of alloys and compounds Vol. 966; p. 171452
Main Authors Fayed, Saad M., Chen, Dongxu, Li, Shengli, Sadawy, M.M., Eid, E.A.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 05.12.2023
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