Evolution of TiAlSi thin film coatings under varying target power in DC magnetron sputtering

• Published in: Proceedings of the Institution of Mechanical Engineers. Part L, Journal of materials, design and applications Vol. 239; no. 4; pp. 776 - 786
• Main Authors: Wambua, Job, Mwema, Fredrick, Zoppi, Guillaume, Woo, Wai-Lok, Akinlabi, Esther
• Format: Journal Article
• Language: English
• Published: London, England SAGE Publications 01.04.2025
• Subjects: target power; deposition; nucleation; DC magnetron sputtering; thin films

This study, for the first time, presents the growth, nucleation, and characteristics of TiAlSi thin films sputtered from a partially sintered Ti30Al16Si10 (at. %) composite target under controlled conditions of target power. The TiAlSi thin films were grown on soda-lime glass substrates through Dire...