Experimental studies on intracrystalline diffusion of NO and NH3 in Cu-CHA
Equilibrium adsorption and intracrystalline diffusion of NO and NH3 in Cu-CHA were experimentally studied using constant volumetric method. The saturated amount of adsorbed NO on Cu-CHA at 373 K linearly increases with Cu loading, which indicates that Cu sites are the adsorption site of NO on Cu-CHA...
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Published in | Catalysis today Vol. 411-412; p. 113823 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
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01.03.2023
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Abstract | Equilibrium adsorption and intracrystalline diffusion of NO and NH3 in Cu-CHA were experimentally studied using constant volumetric method. The saturated amount of adsorbed NO on Cu-CHA at 373 K linearly increases with Cu loading, which indicates that Cu sites are the adsorption site of NO on Cu-CHA. Temperature dependence of adsorption equilibrium constant of NO gives the adsorption enthalpy (− 24 kJ mol-1), regardless of the Cu loading. The activation energy for NO diffusivity in Cu-CHA was evaluated from its temperature dependence of intracrystalline diffusivity (7.0 kJ mol-1). The intracrystalline diffusivity of NO in Cu-CHA is lower than that in Cu-ZSM-5, which can be ascribed to the narrower pore size of CHA. Intracrystalline diffusivity and effective diffusivity of NO were lower than those of NH3 in Cu-CHA. The Weisz-Prater Parameter was calculated using the NH3-SCR reaction rate on Cu-CHA at 508 K and the effective diffusivity of NO. The calculated result indicates that intracrystalline diffusion of NO in Cu-CHA limits the NH3-SCR reaction under the present conditions.
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•Intracrystalline and effective diffusivity of NO and NH3 in Cu-CHA was measured.•Intracrystalline diffusivity of NO depends on the Cu content.•Equation for estimation of NO diffusivity in Cu-CHA was suggested and validated.•Overall reaction rate of NH3-SCR was controlled by NO diffusion rate. |
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AbstractList | Equilibrium adsorption and intracrystalline diffusion of NO and NH3 in Cu-CHA were experimentally studied using constant volumetric method. The saturated amount of adsorbed NO on Cu-CHA at 373 K linearly increases with Cu loading, which indicates that Cu sites are the adsorption site of NO on Cu-CHA. Temperature dependence of adsorption equilibrium constant of NO gives the adsorption enthalpy (− 24 kJ mol-1), regardless of the Cu loading. The activation energy for NO diffusivity in Cu-CHA was evaluated from its temperature dependence of intracrystalline diffusivity (7.0 kJ mol-1). The intracrystalline diffusivity of NO in Cu-CHA is lower than that in Cu-ZSM-5, which can be ascribed to the narrower pore size of CHA. Intracrystalline diffusivity and effective diffusivity of NO were lower than those of NH3 in Cu-CHA. The Weisz-Prater Parameter was calculated using the NH3-SCR reaction rate on Cu-CHA at 508 K and the effective diffusivity of NO. The calculated result indicates that intracrystalline diffusion of NO in Cu-CHA limits the NH3-SCR reaction under the present conditions.
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•Intracrystalline and effective diffusivity of NO and NH3 in Cu-CHA was measured.•Intracrystalline diffusivity of NO depends on the Cu content.•Equation for estimation of NO diffusivity in Cu-CHA was suggested and validated.•Overall reaction rate of NH3-SCR was controlled by NO diffusion rate. |
ArticleNumber | 113823 |
Author | Kushima, Keigo Nakasaka, Yuta Yasumura, Shunsaku Shibata, Gen Masuda, Takao Shimizu, Ken-ichi Totani, Keigo |
Author_xml | – sequence: 1 givenname: Yuta surname: Nakasaka fullname: Nakasaka, Yuta email: nakasaka@eng.hokudai.ac.jp organization: Division of Applied Chemistry, Faculty of Engineering, Hokkaido University, N13 W8, Kita-ku, Sapporo, Hokkaido 060-8628, Japan – sequence: 2 givenname: Keigo surname: Kushima fullname: Kushima, Keigo organization: Division of Applied Chemistry, Faculty of Engineering, Hokkaido University, N13 W8, Kita-ku, Sapporo, Hokkaido 060-8628, Japan – sequence: 3 givenname: Shunsaku surname: Yasumura fullname: Yasumura, Shunsaku organization: Institute for Catalysis, Hokkaido University, N21 W10, Kita-ku, Hokkaido 001-0021, Japan – sequence: 4 givenname: Ken-ichi surname: Shimizu fullname: Shimizu, Ken-ichi organization: Institute for Catalysis, Hokkaido University, N21 W10, Kita-ku, Hokkaido 001-0021, Japan – sequence: 5 givenname: Keigo surname: Totani fullname: Totani, Keigo organization: Division of Applied Chemistry, Faculty of Engineering, Hokkaido University, N13 W8, Kita-ku, Sapporo, Hokkaido 060-8628, Japan – sequence: 6 givenname: Gen surname: Shibata fullname: Shibata, Gen organization: Division of Energy and Environmental Systems, Faculty of Engineering, Hokkaido University, N13W8, Kita-ku, Sapporo, Hokkaido 060-8628, Japan – sequence: 7 givenname: Takao surname: Masuda fullname: Masuda, Takao organization: Division of Applied Chemistry, Faculty of Engineering, Hokkaido University, N13 W8, Kita-ku, Sapporo, Hokkaido 060-8628, Japan |
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