Residual stress analysis of thin films and coatings through XRD2 experiments

• Published in: Thin solid films Vol. 450; no. 1; pp. 143 - 147
• Main Authors: GELFI, M, BONTEMPI, E, ROBERTI, R, ARMELAO, L, DEPERO, L. E
• Format: Conference Proceeding Journal Article
• Language: English
• Published: Lausanne Elsevier Science 22.02.2004
• Subjects: Condensed matter: structure, mechanical and thermal properties; Crystalline state (including molecular motions in solids); Crystallographic aspects of phase transformations; pressure effects; Deformation and plasticity (including yield, ductility, and superplasticity); Exact sciences and technology; Mechanical and acoustical properties of condensed matter; Mechanical properties of solids; Physics; Single-crystal and powder diffraction; Structure of solids and liquids; crystallography; X-ray diffraction and scattering; XRD2; Lanthanum oxides; Inorganic compounds; GIXRD; Phase transformations; Ternary compounds; Transition element compounds; Cobalt oxides; X-ray reflection; Residual stresses; XRD; Rare earth compounds; Experimental study; Coatings; Thin film; Thin films; Image analysis; Crystal growth from solutions; Sol-gel process; Residual stress; Phase transition

Residual stresses are one of the crucial parameters determining the performances of structural as well as functional materials. In the case of coatings and films, the substrate and the deposition process may determine very high residual stress fields which can affect both performances and surface in...