Tailoring the plasmonic properties of ultrathin TiN films at metal-dielectric interfaces [Invited]

The optical properties of a TiN/(Al,Sc)N superstructures deposited on MgO substrates are studied by using first principles approaches. The modifications of the plasmonic response of ultrathin TiN layers when faced to MgO and nitride surfaces are interpreted at the microscopic level, in terms of the...

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Bibliographic Details
Published inOptical materials express Vol. 9; no. 3; p. 1459
Main Authors Catellani, Alessandra, Calzolari, Arrigo
Format Journal Article
LanguageEnglish
Published Washington Optical Society of America 01.03.2019
Subjects
Aluminum
Dielectric properties
Effective medium theory
Electronic structure
First principles
Magnesium oxide
Metamaterials
Optical properties
Quantum confinement
Substrates
Superlattices
Superstructures
Titanium nitride
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Summary:The optical properties of a TiN/(Al,Sc)N superstructures deposited on MgO substrates are studied by using first principles approaches. The modifications of the plasmonic response of ultrathin TiN layers when faced to MgO and nitride surfaces are interpreted at the microscopic level, in terms of the electronic structure of the TiN/dielectric interfaces. The hyperbolic behavior of the multi-stacked metamaterial, described both via the effective medium theory and first principles simulations of periodic TiN/(Al,Sc)N superlattices, is closely investigated and directly compared to recent experimental results. The latter comparison underlines the crucial role of quantum confinement especially for the ultrathin dielectric layers.
ISSN:2159-3930
2159-3930
DOI:10.1364/OME.9.001459