III-V/Si staggered heterojunction based source-pocket engineered vertical TFETs for low power applications
This article presents a comparative study on the performance characteristics of some vertical tunnel field effect transistor (TFET): conventional all-Si TFET with pocket, In0.53Ga0.47As/Si heterojunction TFET with pocket and GaSb/Si heterojunction TFET with pocket. Low band gap materials like In0.53...
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Published in | Superlattices and microstructures Vol. 142; p. 106494 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier Ltd
01.06.2020
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Subjects | |
Online Access | Get full text |
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