III-V/Si staggered heterojunction based source-pocket engineered vertical TFETs for low power applications

This article presents a comparative study on the performance characteristics of some vertical tunnel field effect transistor (TFET): conventional all-Si TFET with pocket, In0.53Ga0.47As/Si heterojunction TFET with pocket and GaSb/Si heterojunction TFET with pocket. Low band gap materials like In0.53...

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Bibliographic Details
Published inSuperlattices and microstructures Vol. 142; p. 106494
Main Authors Tripathy, Manas Ranjan, Singh, Ashish Kumar, Baral, Kamalaksha, Singh, Prince Kumar, Jit, Satyabrata
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.06.2020
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