Optimization on flow field in an operational cleanroom subject to kinematic component and structural parameters

Due to the high uniformity and stability of streamline, unidirectional cleanrooms are widely used in semiconductor clean workshops. However, the moving parts and complex process of production in the cleanrooms may cause disturbance of the streamline, leading to increased contamination. In this study...

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Bibliographic Details
Published inJournal of Building Engineering Vol. 59; p. 105152
Main Authors Liu, Kun, Hao, Ming, Li, Bangyu, Guan, Tianen, Chen, Shulei, Wang, Guipeng, Xie, Yuanhua, Bian, Xin
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 01.11.2022
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